Wednesday, October 31

Wednesday, October 31 Room A (Zuiten Nishi 4F) ... Dense Gold Nanoparticles on Si ... on Laterally Grown ZnO Nanowires using Hydrothermal...

0 downloads 65 Views 755KB Size
Tuesday, October 30 Room C (Zuiten Higashi 4F) 13:10-17:35 MNC 2012 Technical Seminar ''DSA'' Room D (Tenku 5F) 17:40-19:40 Get Together Party

Wednesday, October 31 Room A (Zuiten Nishi 4F) 31A-1: Plenary Session Chairpersons: Y. Ono (Univ. of Toyama) and T. Kozawa (Osaka Univ.) 9:30-9:50 Opening Remark: T. Itani (EIDEC) Award Presentation: Y. Ono (Univ. of Toyama) and T. Itani (EIDEC) MNC 2011 Outstanding Paper, Most Impressive Presentation, Most Impressive Poster and Young Author’s Award Announcement from Committee: J. Fujita (Univ. of Tsukuba)

31A-1-1 9:50 Big Data Transforms Our Society (Plenary) M. Kitsuregawa, Univ. of Tokyo, Japan

Robby (4F in front of Zuiten) Coffee Break Room A (Zuiten Nishi 4F) 31A-1-2 10:50 EUV Lithography : Getting Ready for Insertion ? (Plenary) K. Ronse, IMEC, Belgium

31A-1-3 11:30 Directed assembly of block copolymers for applications in lithography and manufacturing (Plenary) P. Rincon 1,2, H. Suh 1, J.I. Lee 3, M. Bedolla 3, G. Liu 3, C.C. Liu 3, L. Wan 4, R. Ruiz 4, R. Gronheid 2, H.Yoshida 5, P. Nealey 1, 1 Univ. of Chicago, 2 IMEC, 3 Univ. of Wisconsin, 4 HGST, USA and 5 Hitachi, Japan LUNCH

Room A (Zuiten Nishi 4F) 31A-2:Symp. B: Nanoimprint I Chairpersons: A. Yokoo (NTT) H.Y. Low (Inst. of Materials Res. and Eng.)

Room B (Zuiten Naka 4F) 31B-2: Nanostructure Engineered Devices Chairpersons: S. Kasai (Hokkaido Univ.) T. Maemoto (Osaka Inst. of Technol.)

Room C (Zuiten Higashi 4F) 31C-2:Nanomaterials I Chairpersons: T. Chikyo (NIMS) Y. Matsumoto (Tokyo Inst. of Technol.)

Room D (Tenku 5F) 31D-2:Graphene I Chairpersons: K. Maehashi (Osaka Univ.) S. Okada (Univ. of Tsukuba)

31A-2-1 13:30 Progress in NaPANIL Project (Invited)

31B-2-1 13:30 1.3-μm Quantum Dot DFB Laser with Half-etching Mesa Structure

31C-2-1 13:30 2D Oxide Nanosheets: Future High-k Dielectrics from Nano Building Blocks (Invited)

31D-2-1 13:30 Graphene for Future Electronics (Invited)

J. Ahopelto, VTT Technical Res. Centre, Finland

31A-2-2 14:00 Nano-imprint based patterning process for high brightness LEDs (Invited) J. Cho, K. Byeon and H. Lee, Korea Univ., Korea

31A-2-3 14:30 Development of Micro/Nano Imprint with Bulk Metallic Glasses (Invited) F.-Y. Chang and J. P. Chu, Natl. Taiwan Univ. of Sci. and Technol., Taiwan

J.-H. Ahn, Sungkyunkwan Korea

Univ.,

K. Goshima 1, N. Tsuda 1, J. Yamada 1, T. Sugaya 2, K. Komori 2 and T. Amano 2, 1 Aichi Inst. of Technol. and 2 AIST, Japan

M. Osada 1,2 and T. Sasaki 1,2 1 NIMS and 2 JST-CREST, Japan

31B-2-2 13:50 Characteristics of Light Emitting Diodes with a Nanomesh Metal Electrode

31C-2-2 14:00 Magnetoresistance Effects in Current-Perpendicular-to-Plane Structures based on Fe3Si/FeSi2 Artificial Lattices

31D-2-2 14:00 Optimization of Gate Insulating Materials on Graphene for Future CMOS Channels by Raman and Photoelectron Spectroscopy

31C-2-3 14:20 Growth of Atomically Thin Hexagonal Boron Nitride Films from Solid Sources

31D-2-3 14:20 Edge-orientation of Graphene Corner: First-principles Calculations

R. Kitagawa, K. Nakamura, K. Masunaga, E. Tsutsumi, T. Nakanishi, A. Fujimoto and K. Asakawa, Toshiba, Japan

31B-2-3 14:10 Novel Delivery Process of High Dense Gold Nanoparticles on Si Substrate to Introduce Plasmon Absorbance S. Saijo 1,2, B. Zheng 1,2, I. Yamashita 1,2 ,Y. Uraoka 1,2 and Y. Ishikawa 1,2, 1 Nara Inst. of Sci. and Technol. and 2 JST-CREST, Japan

K. Sakai 1, Y. Noda 2, D. Tsumagari 2, T. Sonoda 2, S. Hirakawa 2, K. Takeda 3 and T. Yoshitake 2, 1 Kurume Natl. Coll. of Technol., 2 Kyushu Univ. and 3 Fukuoka Inst. of Technol., Japan

S. Suzuki, R.M. Pallares and H. Hibino, NTT, Japan

-1-

D. Kondo 1,2, K. Hayashi 1,2, J. Yamaguchi 1,2, I. Soga 2, S. Sato 1,2 and N. Yokoyama 1,2, 1 AIST and 2 Fujitsu Labs., Japan

N.T. Cuong 1,3, M. Otani 1,3, and S. Okada 2,3, 1 AIST, 2 Univ. of Tsukuba and 3 JST-CREST, Japan

31A-2 Author's Interview: 16:45-16:55

31B-2-4 14:30 Crucial Role of Ambient Pressure on Thermal Shrinking of Au Nanodot Array G. Meng 1, T. Yanagida 1, K. Nagashima 1, M. Kanai 1, M. Suzuki 2, A. Klamchuen 1, B. Xu 1, F.W. Zhuge 1, S. Rahong 1, Y. He 1 and T. Kawai 1, 1 Osaka Univ. and 2 Kyushu Univ., Japan

31C-2-4 14:40 Production of Graphene Films by Simple Electrochemical Exfoliation using NaCl Solution

E. Kano 1, R. Ueki 1, T. Takahashi 1, S. Akiyama 1, J. Tang 1,2, K. Murakami 1 and J. Fujita 1, 1 Univ. of Tsukuba and 2 NIMS, Japan

31D-2-4 14:40 Synthesis of Graphene Nanoribbons from Amyloid Template on Sapphire Substrate by Liquid Gallium Graphitization R. Ueki 1,2, T. Dong 1,2, Y. Kajiwara 1,2, E. Takai 2, Y. Shikiya 2, K. Shiraki 2, Y. Yamada 2, K. Murakami 1,2 and J. Fujita 1,2, 1 TIMS and 2 Univ. of Tsukuba, Japan

31B-2-5L 14:50 Direct Fabrication of WxCy SNS Josephson Junction by Using Focused-ion-beam Chemical Vapor Deposition

31C-2-5 15:00 Selective-area Metal-organic Vapor Phase Epitaxy of AlGaAs Nanostructures on Crystallized Insulating Al2O3 Layers

31D-2-5 15:00 Direct Graphene Growth with Multi Metal Layers without using Chemical Vapor Deposition

J. Dai 1,2, K. Onomitsu 2, R. Kometani 1, Y. Krockenberger 2, H. Yamaguchi 2, S. Ishihara 1 and S. Warisawa 1, 1 Univ. of Tokyo and 2 NTT, Japan

S. Sakita, M. Yatago and S. Hara, Hokkaido Univ., Japan

K. Gumi, Y. Ohno, K. Maehashi, K. Inoue and K. Matsumoto, Osaka Univ., Japan

31B-2 Author's Interview: 16:55-17:05

31C-2 Author's Interview: 16:55-17:05

31D-2 Author's Interview: 16:55-17:05

Robby (4F in front of Zuiten) Coffee Break Room A (Zuiten Nishi 4F) 31A-3: Symp. B: Nanoimprint II Chairpersons: S. Matsui (Univ. of Hyogo) J. Ahopelto (VTT Technical Res. Centre) 31A-3-1 15:15 Progress of Jet and Flash Imprint Lithography for Volume Manufacturing (Invited) H. Wada, Molecular Imprints, Japan

31A-3-2 15:45 Repairable Nanoimprinted Structures (Invited) H.Y. Low, Inst. of Materials Res. and Eng., Singapore

31A-3-3 16:15 Applying Directed Self-assembling and Nanoimprint lithography for Fabrication of Bit Patterned Media (Invited) N. Kihara, Y. Ootera, R. Yamamoto, N. Sasao, T. Shimada, H. Hieda, T. Okino, Y. Kamata, and A. Kikitsu, Toshiba, Japan

31A-3 Author's Interview: 16:45-16:55

Room B (Zuiten Naka 4F) 31B-3:Nanoscale Memory Chairpersons: T. Yanagida (Osaka Univ.) Y. Ishikawa (Nara Inst. of Sci. and Technol.) 31B-3-1 15:35 Gate Structure Dependence of Variability in Poly-Si FinFET Flash Memories

Y.X. Liu 1, T. Kamei 2, T. Matsukawa 1, K. Endo 1, S. O'uchi 1, J. Tsukada 1, H. Yamauchi 1, Y. Ishikawa 1, T. Hayashida 2, K. Sakamoto 1, A. Ogura 2 and M. Masahara 1, 1 AIST and 2 Meiji Univ., Japan

31B-3-2 15:55 Structural Analysis of TiO2/Ti Film Resistive Switched by AFM Probes

H. Nakano 1, M. Takahashi 1, M. Sato 1, M. Kotsugi 2, T. Ohkochi 2, T. Muro 2, M. Nihei 1 and N. Yokoyama 1, 1 AIST and 2 JASRI, Japan

Room C (Zuiten Higashi 4F) 31C-3:Nanomaterials II Chairpersons: K. Terabe (NIMS) T. Chikyo (NIMS) 31C-3-1 15:35 Surrounding Effects on Nanoscale Memristive Switching Behaviors K. Nagashima 1, T. Yanagida 1, M. Kanai 1, K. Oka 1, B.H. Park 2, T. Kawai 1,2, 1 Osaka Univ., Japan and 2 Konkuk Univ., Korea

31C-3-2 15:55 Observation of Light induced Pyroelectric Transient in Single Sb2Se3 Nanowires

T.Y. Ko and K.W. Sun, Natl. Chiao Tung Univ., Taiwan

Room D (Tenku 5F) 31D-3: Carbons Nanotube II Chairpersons: S. Chiashi (Univ. of Tokyo) M. Tanemura (Nagoya Inst. of Technol.) 31D-3-1 15:35 Growth Mechanism of Horizontally Aligned Single-walled Carbon Nanotubes on R-cut Crystal Quartz Substrates

S. Chiashi, T. Inoue, D. Hasegawa, S. Badar and S. Maruyama, Univ. of Tokyo, Japan

31D-3-2 15:55 Polarization Dependence of G Band of Single-walled Carbon Nanotubes oriented on Quartz Single Crystal Surfaces

I. Shimoyama 1,2, X. Li 2 and T. Shimada 2,3, 1 JAEA, Japan, 2 Stanford Univ., USA and 3 Nagoya Univ., Japan

31B-3-3 16:15 Confined Resistive Switching of TiO2 Dielectrics Resistive Random Access Memory with a Nanopore in the TiO2 Film created by Focus Ion Beam

31C-3-3 16:15 Preparation and Characteristic of Relative Humidity Sensors based on Laterally Grown ZnO Nanowires using Hydrothermal Method

31D-3-3 16:15 Multiple Investigation of Charge Transfer between Single-walled Carbon Nanotubes and N-type Dopants

F.-S. Tsai, S.-J. Wang, Y.-C. Tu, T.-H. Lin and J.-C. Lin, Natl. Cheng Kung Univ., Taiwan

R. Shimizu 1, S. Matsuzaki 1, K. Yanagi 2 and T. Takenobu 1, 1 Waseda Univ. and 2 Tokyo Metropolitan Univ., Japan

31B-3-4 16:35 Magnetite Bio-nanoparticle for Nano Resistive Memory

31C-3-4 16:35 First-principles Simulation on Polymorph Dependence of Piezoresistivity in Silicon Carbide Nanowires

31D-3-4 16:35 Wave Packet Dynamics Simulations on Electronic Transport in Nano-carbon Materials

31C-3 Author's Interview: 16:55-17:05

31D-3 Author's Interview: 16:55-17:05

C.-H. Wu 1, C.-J. Hsieh 2 and S.-J. Wang 2, 1 Chung Hua Univ. and 2 Natl. Cheng Kung Univ., Taiwan

K. Kado 1,2, T. Ban 1,2, M. Uenuma 1,2, Y. Kakihara 1,2, B. Zheng 1,2, M. Horita 1,2, Y. Ishikawa 1,2, I. Yamashita 1,2 and Y. Uraoka 1,2, 1 Nara Inst. of Sci. and Technol. and 2 JST-CREST, Japan

K. Nakamura 1,2, 1 Kyoto Univ., Japan and 2 Egypt-Japan Univ. of Sci. and Technol., Egypt

31B-3 Author's Interview: 16:55-17:05

Robby (4F in front of Zuiten) 17:10-18:40 Happy Hour

-2-

Y. Takada, K. Takashima and T. Yamamoto, Tokyo Univ. of Sci., Japan

Thursday, November 1 Room A (Zuiten Nishi 4F) 1A-4:Symp. A: Extreme Ultraviolet Lithography and Lithography Extensions I Chairpersons: T. Sato (Toshiba) J. Miyazaki (ASML)

Room B (Zuiten Naka 4F) 1B-4:BioMEMS, Lab on a Chip I Chairpersons: K. Furukawa (NTT) K. Tawa (AIST)

Room C (Zuiten Higashi 4F) 1C-4:Nanoimprint, Nanoprint and Rising Lithography I Chairpersons: H. Hiroshima (AIST) F.-Y. Chang (National Taiwan Univ.)

Room D (Tenku 5F) 1D-4: Graphene II Chairpersons: D. Kondo (Fujitsu Labs.) M. Nagase (Univ. Tokushima)

1A-4-1 9:00 Recent Activities on EUVL in NewSUBARU (Invited)

1B-4-1 9:00 Evaluation of Electrophoretic Mobility of Individual Exosomes by Microcapillary Electrophoresis with Laser Dark-field Microscopy

1C-4-1 9:00 Continuous and High-throughput Patterning Techniques and Their Applications in Photonics and Transparent Conductors (Invited)

1D-4-1 9:00 Electrical Resistivity Measurements of Layer Number Determined Multi-layer Graphene for Future LSI Interconnects

H. Kinoshita 1,2 T. Watanabe 1,2 and T. Harada 1,2, 1 Univ. of Hyogo and 2 JST-CREST, Japan

1A-4-2 9:30 Current Progress of Advanced EUVL Development in EIDEC (Invited)

S. Inoue, H. Watanabe, T. Itani, and I. Mori, EIDEC, Japan

K. Kato 1, M. Kobayashi 1, T. Akagi 1, N. Kosaka 2, T. Ochiya 2 and T. Ichiki 1, 1 Univ. of Tokyo and 2 Natl. Cancer Center Research Inst., Japan

S. Sivakumar, Intel, USA

1A-4 Author's Interview: 12:15-12:25

K. Ito 1, M. Katagiri 2, T. Sakai 2 and Y. Awano 1, 1 Keio Univ. and 2 LEAP, Japan

1B-4-2 9:20 Tempospatial External Field Potential Fluctuation Measurement in Constructive Cardiomyocyte Network for in vitro Predictive Cardiotoxicity

1C-4-2 9:30 Novel Organic Radiation Detector with Nanoimprinted Structure

1D-4-2 9:20 Multiple Exciton Generation in Graphene Nanoribbon

1B-4-3 9:40 Visualizing a Transient Molecular Encounter leading to Single DNA Digestion in Fluid

1C-4-3 9:50 Enhanced Light Extraction Efficiency of W-OLED using UV-nanoimprinted AR Structure Glass

1D-4-3 9:40 Effects of Internal Strain induced by Low-energy Electron Beam Irradiation on Graphene

1B-4-4 10:00 Fabrication of Fine mRNA Patterns using Microintaglio Printing Method

1C-4-4 10:10 Study of the Resistance of Antisticking Layer on Repeated UV Nanoimprint

1D-4-4 10:00 In situ Observation of Graphene during Gate Oxide Formation using Raman Spectroscopy

1B-4-5 10:20 Oxide Nanowires DNA Chip for Long DNA Molecules Manipulation

1C-4-5 10:30 Study of Organic Thin Film Transistors on UV-curable Dielectrics with Periodic Patterns fabricated by Nano Imprint Technology

1D-4 Author's Interview: 11:55-12:05

T. Hamada, F. Nomura, T. Kaneko, K. Yasuda, Tokyo Medical and Dental Univ., Japan

1A-4-3 10:00 Next Generation Lithography: Challenges for High Volume Manufacturing (Invited)

L.J. Guo, S.H. Ahn, J.G. Ok and M.K. Kwak, Univ. of Micigan, USA, Univ. of Micigan, USA

of

D. Onoshima 1, N. Kaji 1, M. Tokeshi 1,2 and Y. Baba 1,3, 1 Nagoya Univ., 2 Hokkaido Univ. and 3 AIST, Japan

R. Kobayashi 1, Y. Tanaka 1, S. Ueno 1,2, M. Biyani 1,2 and T. Ichiki 1,2, 1 Univ. of Tokyo and 2 JST-CREST, Japan

S. Rahong 1, T. Yanagida 1,2, M. Kanai 1, A. Klamchuen 1, M. Gang 1, K. Nagashima 1, T. Yasui 3, N. Kaji 3, Y. Baba 3,4 and T. Kawai 1, 1 Osaka Univ., 2 JST-PRESTO, 3 Nagoya Univ. and 4 AIST, Japan

K. Tada 1, E. Takada 1, K. Tomohiro 2, K. Fujii 1, Y. Masuyama 1 and Y. Hirai 2, 1 Toyama Natl. Coll. of Technol. and 2 Osaka Pref. Univ., Japan

K.-Y. Cheng 1, C.-K. Huang 2, M.-Y. Chang 2, H.-Y. Lin 1 and T.-H. Chou 1, 1 ITRI and 2 Natl. Sun Yat-Sen Univ., Taiwan

S. Iyoshi 1,5, M. Okada 1,5,6, K. Kobayashi 3,5, S. Kaneko 3,5, T. Katase 2, K. Tone 2, Y. Haruyama 1,5, M. Nakagawa 3,5, H. Hiroshima 4,5 and S. Matsui 1,5, 1 Univ. of Hyogo, 2 Meisyo Kiko, 3 Tohoku Univ., 4 AIST, 5 JST-CREST and 6 JSPS, Japan

S. Konabe and S. Okada, Univ. of Tsukuba, Japan

T. Kadowaki 1,2, K. Murakami 1,2 and J. Fujita 1,2, 1 TIMS and 2 Univ. of Tsukuba, Japan

R. Sato, H. Fukidome and M. Suemitsu, Tohoku Univ., Japan

H.J.H. Chen 1, J.-Y. Chen 1, S.-Z. Chen 2 and J.-C. Huang 2, 1 Natl. Chi Nan Univ. and 2 Natl. Tsing Hua Univ., Taiwan

1B-4 Author's Interview: 10:40-10:50

1C-4 Author's Interview: 12:25-12:35

Robby (4F in front of Zuiten) Coffee Break Room A (Zuiten Nishi 4F) 1A-5:Symp. A: Extreme Ultraviolet Lithography and Lithography Extensions II Chairpersons: S. Nagahara (Tokyo Electron) K. Ogino (Fujitsu Semiconductor)

Room B (Zuiten Naka 4F) 1B-5: 11:05-12:35 Material & Process for MEMS I Chairpersons: H. Takao (Kagawa Univ.) T. Ando (Ritsumeikan Univ.)

Room C (Zuiten Higashi 4F) 1C-5: Nanoimprint, Nanoprint and Rising Lithography II Chairpersons: J. Taniguchi (Tokyo Univ. of Sci.) A. Yokoo (NTT)

-3-

Room D (Tenku 5F) 1D-5: 10:35-11:55 Carbon Nanotuber II Chairpersons: S. Akita (Osaka Pref. Univ.) S. Chiashi (Univ. of Tokyo)

1A-5-1 10:45 High CE Technology Source for HVM (Invited) H. Mizoguchi and Gigaphoton, Japan

T.

EUV Saitou,

1B-5-1 11:05 Experimental Nano Mechanics for Silicon & Carbon Nanomaterials Using MEMS Technology (Invited)

1C-5-1 11:05 Solvent Assisted Nanoimprint Lithography as Block Copolymers Directed Selfassembly Tool

1D-5-1 10:35 Carbon Nanotube Solar Cell utilizing Semiconducting Carbon Nanotube as Exciton Generators

1C-5-2 11:25 Combination of Circular PDMS Mold and Gasbag Roller to Replicate Continuous Anodic Aluminum Oxide Nano Structures by UV Resin on PC Film

1D-5-2 10:55 Degradation of Carbon Nanotube Emitters in High Electric Field

1C-5-3 11:45 Uniform Residual Layer Creation in UV Nanoimprint using Spin Coat Films for Sub-100nm Patterns with Various Pattern Densities

1D-5-3 11:15 Carbon Nanotube-based Memory with Atomic-Layer-Deposited Dielectrics

1B-5-4 12:15 Evaluation of a Capacitive Sensor with a Gold Proof Mass toward Integrated CMOS-MEMS Accelerometers

1C-5-4 12:05 Fabrication of Nano and Micron Size Mixture Patterns by Edge Lithography

1D-5-4 11:35 Inkjet Printing of Aligned Carbon-nanotube Thin Films

1B-5 Author's Interview: 15:10-15:20 Room B (Zuiten Naka 4F) 1B-6: Material &Process for MEMS II Chairpersons: N. Miki (Keio Univ.) M. Sohgawa (Osaka Univ.) 1B-6-1 13:40 Micromachining Techniques for Wider Variety of 3D Devices (Invited)

1C-5 Author's Interview: 12:25-12:35 Room C (Zuiten Higashi 4F) 1C-6:Functional Nanodevices Chairpersons: N. Banno (Leap) Y. Ono (Univ. of Toyama)

1D-5 Author's Interview: 11:55-12:05 Room D (Tenku 5F) 1D-6: Nano-Tool Chairpersons: S. Akita (Osaka Pref. Univ.) T. Ono (Tohoku Univ.)

1C-6-1 13:50 Quantum Computing in Silicon with Donor Electron Spins (Invited)

1D-6-1 13:20 High-speed Robotic Tools integrated with Microfluidic Chip for Biomedical Innovation (Invited)

Y. Isono, Kobe Univ., Japan

1A-5-2 11:15 Resist materials for lithography (Invited)

EUV

S. Tarutani, Fujifilm, Japan

1B-5-2 11:35 P-type Sb2Te3 and n-type Bi2Te3 Films for Thermoelectric Modules deposited by Thermally-assisted Sputtering Method

M. Mizoshiri, M. Mikami and K. Ozaki, AIST, Japan

C. Simao 1, N. Kehagias 1, D. Borah 2,3, B. Kosmala 2,3, M. Salaun 4, M. Zelsmann 4, M.A. Morris 2,3 and C.M. Sotomayor Torres 1,5, 1 UAB, Spain, 2 Tyndall Natl. Inst. UCC and 3 Trinity Coll. Dublin, Ireland, 4 CNRS, France and 5 ICREA, Spain

E.-S. Kim and W.-J. Kim, Gachon Univ., Korea

T. Emi, K. Kuroda, K. Hirahara and Y. Nakayama, Osaka Univ., Japan

Y.-H. Lee, R.-H. Hong, K.-H. Lu and S.-Y. Yang, Natl. Taiwan Univ., Taiwan

1A-5-3 11:45 Challenges of EB Writer for EUV Mask (Invited)

S. Yoshitake, S. Wake, Y. Sengoku, S. Hayashi, T. Iijima, M. Ogasawara and K. Hattori, NuFlare Technol., Japan

1A-5 Author's 12:15-12:25

Interview:

1B-5-3 11:55 Microfabrication of Absorbent Polymer Nanoimprinting and Swelling Process

Super by Post

T. Inaba, T. Kano and N. Miki, Keio Univ., Japan

D. Yamane 1, T. Matsushima 2, T. Konishi 2, G. Motohashi 1, H. Ito 1, N. Ishihara 1, H. Toshiyoshi 3, K. Machida 1,2 and K. Masu 1, 1 Tokyo Inst. of Technol., 2 NTT-AT and 3 Univ. of Tokyo, Japan

Room A (Zuiten Nishi 4F) 1A-6: Lithogphay and Metrology Chairpersons: H. Kawai (Nikon) H. Yamashita (HOYA) 1A-6-1 13:40 Plasmon-enhanced Photochemical Reactions on Nano-engineered Gold Particles (Invited) K. Ueno, Hokkaido JST-PRESTO, Japan

Univ.

and

1A-6-2 14:10 EUV Interference Lithography at Swiss Light Source

L. Wang, M. Hojeij, M. Vockenhuber, B. Terhalle, E. Kirk, J. Gobrecht and Y. Ekinci, Paul Scherrer Inst., Switzerland

1A-6-3 14:30 An EUV Mask-imaging Microscope for Lithography Generations with sub-16 nm Half Pitch M. Toyoda, K. Yamasoe, K. Uchida and M. Yanagihara, Tohoku Univ., Japan

M. Sasaki and S. Kumagai, Toyota Technological Inst., Japan

K. Suzuki 1,2,3, S.-W. Youn 2,3, Q. Wang 2,3, H. Hiroshima 2,3 and Y. Nishioka 1, 1 Nihon Univ., 2 AIST and 3 JST-CREST, Japan

H. Noma 1,2, J. Sakamoto 1, H. Kawata 1,2, M. Yasuda 1,2 and Y. Hirai 1,2, 1 Osaka Pref. Univ. and 2 JST-CREST, Japan

M.Y. Simmons, Univ. of New South Wales, Australia

Y. Fujii, T. Kamimura, Y. Ohno, K. Maehashi, K. Inoue and K. Matsumoto, Osaka Univ., Japan

Y. Takagi 1, Y. Nobusa 1, S. Gocho 1, K. Yanagi 2, H. Kataura 3 and T. Takenobu 1, 1 Waseda Univ., 2 Tokyo Metropolitan Univ. and 3 AIST, Japan

F. Arai, Nagoya Univ., Japan

1B-6-2 14:10 Polymer Micro-needle Electrodes coated with Nanoporous Parylene

1C-6-2 14:20 Si Phononic Crystal Nanostructures for Controlling Thermal Conduction

1D-6-2 13:50 Quantitative Measurements of Local Charge Density at Solid / Liquid Interfaces by FM-AFM

1B-6-3 14:30 A Post-CMOS Formation Process of High Adhesion SU-8 Structures for Reliable Fabrication of Integrated MEMS Microsensors

1C-6-3 14:40 Fabrication and Characterization of A GaAs Nanowire Device Having Multiple Asymmetric Gates for Electrical Brownian Ratchet

1D-6-3 14:10 Carbon Nanotube Photo Cathode Array based on Si Pn Junction Photo Diode

Y. Nishinaka 1, R. Zen 1, G.S. Prihandana 1, Y. Ami 1, N. Miki 1,2, 1 Keio Univ. and 2 JST-PRESTO, Japan

Y. Maeda, K. Terao, T. Suzuki, F. Shimokawa and H. Takao, Kagawa Univ., Japan

M. Nomura, Univ. of Tokyo, Japan

T. Tanaka, Y. Nakano and S. Kasai, Hokkaido Univ., Japan

-4-

K. Umeda 1, Y. Hirata 2, N. Oyabu 1, K. Kobayashi 1, K. Kazumi 1 and H. Yamada 1, 1 Kyoto Univ. and 2 AIST, Japan

Y. Tanaka, H. Miyashita, M. Esashi and T. Ono, Tohoku Univ., Japan

1A-6-4 14:50 Highly Precise Cross-sectional Measurement of Photoresist Shrinkage

T. Ohashi 1, T. Sekiguchi, A. Yamaguchi 1, J. Tanaka 1 and H. Kawada 2, 1 Hitachi and 2 Hitachi High-Technol., Japan

1A-6-5 15:10 130-kV High-resolution Electron-Beam Lithography System for Sub-10nm Nanofabrication

1B-6-4 14:50 Room Temperature Wafer Bonding of Metal Films using Flattening by Thermal Imprint Process

1C-6-4 15:00 Rectification Effects of ZnO-based Transparent Nano-diodes on Glass and Flexible Plastic Substrates

1D-6-4 14:30 Photothermal Actuation of Cantilevered Multiwall Carbon Nanotubes with Bi-material Configuration toward Calorimeter

1B-6 Author's Interview: 15:10-15:20

1C-6 Author's Interview: 15:20-15:30

1D-6 Author's Interview: 14:50-15:00

Y. Kurashima, A. Maeda, R. Takigawa and H. Takagi, AIST, Japan

Y. Kimura 1, Y. Sun 1, T. Maemoto 1, S. Sasa 1, S. Kasai 2 and M. Inoue 1, 1 Osaka Inst. of Technol. and 2 Hokkaido Univ., Japan

S. Hiroshima 1, A. Yoshinaka 1, T. Arie 1,2 and S. Akita 1,2, 1 Osaka Pref. Univ. and 2 JST-CREST, Japan

T. Okino, Y. Kuba , M. Shibata and H. Ohyi, Crestec, Japan

1A-6 Author's Interview: 15:30-15:40 Robby (4F in front of Zuiten) Coffee Break Room P1 (Kaiou 4F) and Room P2 (Ginga 4F)

1P-7: 15:40-17:40 Poster Session I Lithography and Metrology 1P-7-1 Expanded Field of View of Multiple-beam Scanning Electron Microscope

1P-7-2 Withdrawn

1P-7-3 120W Injection-locked ArF Excimer Laser for Multi-patterning Lithography

M. Sakakibara, M.Enyama, S. Tanimoto and and H. Ohta, Hitachi, Japan

Y. Sasaki, T. Asayama, H. Masuda, T. Kumazaki, H. Tsushima, A. Kurosu, K. Kakizaki, T. Matsunaga and H. Mizoguchi, GIGAPHOTON, Japan

1P-7-4 1Xnm Node Fin-type SRAM Layout Design by ArF Computational Lithography and T-CAD Application K. Kadota, K. Fukuda, S.O'uchi and M. Masahara, AIST, Japan

1P-7-5 Estimation of Electron Temperature and Density of the Decay Plasma in a Laser-assisted Discharge Plasma Extreme Ultraviolet Source by using a Modified Stark Broadening Method

1P-7-6 Phase Imaging of EUV Mask using Coherent EUV Scatterometry Microscope

1P-7-7 Impact of Pattern Profile on Plasmon in Computational Lithography

1P-7-8 Withdrawn

1P-7-9 Extreme Ultraviolet Aberration Impact on 14 nm Node 6T-SRAM Design

1P-7-10 Lloyd's Mirror Interference Lithography using a Single Mode Fiber Spatial Filter

1P-7-11 Metrology Analysis of Sub-100 nm Grating Patterns using High Precision Transmission Small Angle X-ray Scattering Technique

1P-7-106L Electron Beam Current Dependence of Surface Potential Distribution at a Resist Film

1P-7-14 Reactions of Polymer Bound/Blend Photo Acid Generators with Solvated Electrons and Acid Generation Efficiency

1P-7-15 Negative Tone Development Process and Resist Materials with ArF Immersion Exposure Process

1P-7-19 Development of High-performance-charcoal-com posite Paper and its Electrical Conductivity

1P-7-20 Optical Properties of Quantum Dot consisting of Single-walled Carbon Nanotube/Molecule Heterojunctions

T. Harada 1,3, M. Nakasuji 1,3, Y. Nagata 2,3, T. Watanabe 1,3 and H. Kinoshita 1,3, 1 Univ. of Hyogo, 2 RIKEN and 3 JST-CREST, Japan

S.-K. Kim, Hongik Univ., Korea

T. Muto, Q. Zhu, J. Yamada, N. Kishi, M. Watanabe and E. Hotta, Tokyo Inst. of Technol., Japan

S.-E. Tseng and A. Chen, ASML, Taiwan

E.-C. Chang, Y.-L. Sun, P.-T. Lin, D.G. Mikolas and C.-C. Fu, Natl. Tsing Hua Univ., Taiwan

J. Lee, B. Park, S. Lee, S. Ban, S. Moon, T.J. Shin and O. Kim, POSTECH, Korea

A. Osada, M. Otani, K. Kumagai and M. Kotera, Osaka Inst. of Technol., Japan

Resist Materials and Processing 1P-7-12 Deprotonation of Poly(4-hydroxystyrene)Intermedi ates: Pulse Radiolysis Study of EUV and Electron Beam Resist

K. Okamoto 1,2, R. Matsuda 1, T. Kozawa 2,3, S. Tagawa 2,3, R. Fujiyoshi 1, T. Sumiyoshi 1, 1 Hokkaido Univ., 2 JST-CREST and 3 Osaka Univ., Japan

1P-7-13 The Analytical Mitigation of EUV Resist for the High Sensitivity and the Low LWR using SR Absorption Spectroscopy

T. Watanabe, D. Shiono, Y. Haruyama, K. Emura, T. Urayama, K. Ohmori, K. Sato, T. Harada and H. Kinoshita, Univ. of Hyogo, Japan

S. Tarutani, FUJIFILM, Japan

S. Enomoto 1,2, D.T. Nguyen 1,2 and S. Tagawa 1,2, 1 Osaka Univ. and 2 JST-CREST, Japan

1P-7-16 Study on Dissolution Behavior of Polymer-bound and Polymer-blended Photoacid Generator Resists

H. Yamamoto 1,2, T. Kozawa 1,2 and S. Tagawa 1,2, 1 Osaka Univ. and 2 JST-CREST, Japan

Nanocarbons 1P-7-17 Electric Property of CNT/n-type 6H-SiC Heterojunctions formed by Surface Decomposition of SiC

T. Yajima, S. Sakakibara, S. Naritsuka and T. Maruyama, Meijo Univ., Japan

1P-7-18 Nanostructure of PtCo Bimetal Particles for PEFC

K. Sato 1, T. Onuma 1, K. Iwasawa 1, M. Eguchi 1, Y. Kobayashi 1, K. Komatsu 2, M. Kobori 2, M. Nishitani-Gamo 2, T. Ando 3, 1 Ibaraki Univ., 2 Toyo Univ. and 3 NIMS, Japan

M. Yoshihara 1, N. Tamura 2 and T. Oya 1, 1 Yokohama Natl. Univ. and 2 Heigen, Japan

-5-

A. Hida and K. Ishibashi, RIKEN, Japan

1P-7-21 Electronic Properties of Carbon Nanotubes under the Electric Field

A. Yamanaka 1 and S. Okada 1,2 1 Univ. of Tsukuba and 2 JST-CREST, Japan

1P-7-25 Energetics and Electronic Structures of Alkanes Adsorbed on Graphene

K. Kamiya 1,2 and S. Okada 1,2, 1 Univ. of Tsukuba and 2 JST-CREST, Japan

1P-7-29 Inhibitive Corrosion Graphene Layers on Stainless Steel SUS304

J.-N. Shi 1, N.-W. Pu 2, Y.-M. Liu 1, N.-T. Wen 3 and M.-D. Ger 1, 1 Natl. Defense Univ., 2 Yuan Ze Univ. and 3 Chung Shan Inst. of Sci. and Technol., Taiwan

1P-7-22 Carbon Nanocoil Grown by Chemical Vapour Deposition on SiO2 Supported Pd Nanoparticles

1P-7-23 Electronic Structures of Bilayer Graphene under Electric Field

1P-7-26 Phosphorescence of Oxygen Functional Group on the Zigzag Edge and Armchair Edge of Graphene as a Light Source in Bio-Led

1P-7-27 Graphene as a Buffer Layer for the Growth of SiC Thin Film on Insulator on Silicon for Advanced Heterogeneous Integration

1P-7-28 Chemical Vapor Deposited Large-area Graphene for Photovoltaic Device Application

1P-7-30 Bonding Mechanism of Li-graphene with Nitrogen Defects for Hydrogen Storage

1P-7-31 Performance Enhancement of Electrically Conductive Adhesives using Graphene

1P-7-32 Edge Effects and Mechanical Deformation Effects on Thermoelectric Power of Graphene Nanoribbons

S. Konabe and S. Okada, Univ. of Tsukuba, Japan

W.K. Huang 1, K.J. Chung 1, Y.M. Liu 1, N.W. Pu 2, M.D. Ger 1, 1 Natl. Defense Univ. and 2 Yuan Ze Univ., Taiwan

Y.H. Su, Natl. Dong Hwa Univ., Taiwan

S. Lee and Y.-C. Chung, Hanyang Univ., Korea

B. Astuti 1, S.F.A. Rahman 1, M. Tanikawa 2, K. Yasui 2 and A.M. Hashim 1, 1 Univ. Teknologi Malaysia, Malaysia and 2 Nagaoka Univ. of Technol., Japan

W.F. Ke 1, J.Y. Chen 1, G.N. Shi 1, N.W. Pu 2, Y.M. Liu 1 and M.D. Ger 1, 1 Natl. Defense Univ. and 2 Yuan Ze Univ., Taiwan

1P-7-24 Work Function Tuning of Graphene on Water-adsorbed Corundum Substrate

S.B. Cho and Y.-C. Chung, Hanyang Univ., Korea

G. Kalita 1, S. Sharma 1, M. Umeno 2, Y. Hayashi 1 and M. Tanemura 1, 1 Nagoya Inst. of Technol. and 2 Chubu Univ., Japan

T. Kato 1, S. Usui 2, T. Yamamoto 1, 1 Tokyo Univ. of Sci., 2 QuantumWise, Japan

1P-7-33 Fluorination Process of Graphene using Ar/F2 Plasma

A. Matsutani, K. Tahara, T. Iwasaki and M. Hatano, Tokyo Inst. of Technol., Japan

Nanodevices 1P-7-34 CMOS-compatible Tunnel FETs with 14 nm Gate, Sigma-shape Source, and Recessed Channel M.-C. Sun 1,2, S.W. Kim 1, H.W. Kim 1, H. Kim 1 and B.-G. Park 1, 1 Seoul Natl. Univ. and 2 Samsung Electronics, Korea

1P-7-38 High Current Driving of SnO2 Channel Thin Film Transistor using HfO2/ZrO2 High-k Gate Dielectrics

Y.-C. Liu 1, C.-H. Wu 2, C.-C. Chang 2, C.-F. Chang 2, Y.-H. Tsai 2, K.-M. Chang 1 and J.-P. Leu 1, 1 Natl. Chiao Tung Univ. and 2 Chung Hua Univ., Taiwan

1P-7-42 InGaAs-Si Heterojunction Tunneling Field-effect Transistor based on Silicon Substrate

S.Y. Woo 1, Y.J. Yoon 1, J.-H. Bae 1, S. Cho 2, J.-H. Lee 1 and I.M. Kang 1, 1 Kyungpook Natl. Univ., Korea and 2 Stanford Univ., USA

1P-7-35 Manufacturing P- and N- type Ge gate-all-around FETs on Si S.-H. Hsu 1, C.-L. Chu 1, G.-L. Luo 1, Y.-H. Wang 2, Y.-L. Chen 1, M.-L. Guo 1, D.-H. Zhou 1, 1 Natl. Nano Device Labs. and 2 Natl. Chiao Tung Univ., Taiwan

1P-7-36 Fin Shape Effect on the Electrical Characteristics of N-channel FinFET

J.T. Ryu, D.H. Kim and T.W. Kim, Hanyang Univ., Korea

1P-7-37 Comparative Study of Device Performance and Bias-stress Instabilities in Amorphous InGaZnO Thin-film Transistors with Various High-k Gate Dielectrics S.-W. Lee and W.-J. Kwangwoon Univ., Korea

Cho,

1P-7-39 Comparative Analysis of Top and Bottom Contact Organic Thin Film Transistors and Contact Resistance Estimation by 2-D Simulations

1P-7-40 Effect of Cooling Condition on Molecular Distribution quenched in Crystal Grains in a Solution-processed Organic Thin-film Transistor

1P-7-41 Investigation on Effects of Changing Body Doping Concentration in Short-channel Junctionless Transistor

1P-7-43 The Enhancement of Detection Limit by Selective Modification on Ultra-Thin Body Field-Effect Transistor

1P-7-44 Collision based Computing for Arrayed Single-electron Oscillators

1P-7-45 Characterization of GaAs-based Three-branch Nanowire Junction Devices by Light-induced Local Resistance Modulation Method

1P-7-47 NADP+-functionalized Quantum Dots for the Detection of γ-Aminobutyric Acid

1P-7-48 Multifunctional Core-shell Nanoparticles as Bioanalytical Tools for in vitro Tracking of DNA-transfection

1P-7-49 Effects of CdSe Quantum Dot Concentration on the Performance of P3HT:PCBM Solar Cells

1P-7-52 pH Sensing Characteristics of Extended Gate Field-effect-transistor based on Amorphous InGaZnO Thin Films

1P-7-53 Symmetric Linear Polarization of Photoluminescence from InGaAs-buried InAs Quantum Dots controlled by Temperature

K. Bhargava, P.A. Palod, A. Bilgaiyan and V. Singh, Indian Inst. of Technol. Indore, India

H.H. Liu, T.H. Lin and J.T. Sheu, Natl. Chiao Tung Univ., Taiwan

J.-H. Bae, J.-S. Park and H.-R. Kim, Kyungpook Natl. Univ., Korea

S. Hayashi and T. Oya, Yokohama Natl. Univ., Japan

H.W. Kim 1, M.-C. Sun 1,2, S.W. Kim 1, J.Y. Seo 1, G. Kim 1, J.H. Kim 1 and B.-G. Park 1, 1 Seoul Natl. Univ. and 2 Samsung Electronics, Korea

M. Sato and S. Kasai, Hokkaido Univ., Japan

Nanomaterials 1P-7-46 Annealing and Recrystallization of Polyvinylidenefluoride-trifluoroethylene (70:30 mol %) Thin Film

M.H. Wahid 1,2, A.N. Arshad 1, M.D. Rozana 1, S.Z. Saad 1, M. Rusop 1 and W.H. Majid 2, 1 Univ. Teknologi MARA and 2 Univ. Malaya, Malaysia

1P-7-50 Electrochemistry Assisted Laser Ablation in Liquids: A General Strategy for Fabricating Polyoxometalate Nanostructures

P. Liu, Y. Liang, X.Z. Lin and G.W. Yang, Sun Yat-sen Univ., China

Z. Fei and J.S. Kim, Gachon Univ., Korea

1P-7-51 Exploring Index Matched Transparent Conducting Oxide Material for Liquid Crystal on Si Projection Display

S.Y. Park, J.H. Lee and B.H. Choi, Korea Inst. of Industrial Technol., Korea

N. Reinhardt, L. Adumeau, O. Lambert, P. Bonafous, S. Ravaine and S. Mornet, Université Bordeaux, France

J.-G. Gu, H.-J. Jang and W.-J. Cho, Kwangwoon Univ., Korea

-6-

E.-K. Park 1, H.M. Choi 2, D. Han 1, I.A. Ji 2, J.H. Bang 2 and Y.-S. Kim 1, 1 Myongji Univ. and 2 Hanyang Univ., Korea

K. Kikushima 1, T. Tanaka 1, S. Nakashima 1,2 and K. Mukai 1, 1 Yokohama Natl. Univ. and 2 RIKEN, Japan

1P-7-54 Thermal Stability of AlN Layer formed by Translational Kinetic Energy induced N2 Adsorption on Al(111) Surface M. Jinno 1,2, Y. Teraoka 1,2, T. Takaoka 3, J.R. Harris 1, R. Okada 1,4, Y. Iwai 1,2, A. Yoshigoe 1 and T. Komeda 3, 1 JAEA, 2 Univ. of Hyogo, 3 Tohoku Univ. and 4 Univ. of Tsukuba, Japan

1P-7-55 Stability of Lithium Adatom Adsorption on Hexagonal Boron Nitride Monolayer: Van der Waals Density Functional Theory

Y. Hwang and Y.-C. Chung, Hanyang Univ., Korea

1P-7-56 Improved Barrier Properties using Al2O3 Single Layer of Organic Light Emitting Diode Lighting Devices

M.R. Kim, J.H. Lee and B.H. Choi, Korea Inst. of Industrial Technol., Korea

1P-7-57 Effect of Organic Semiconductor Film Formation on the Magnitude of the Interfacial Trap Density in a Low-voltage Operated Thin-film Transistor J.-H. Bae, H.G. Lee and I.M. Kang, Kyungpook Natl. Univ., Korea

1P-7-58 Nonvolatile Organic Memory Devices with CdSe or CdTe Nanoparticles H.-G. Kim 1, M.-J. Gim 1, H.-J. Jeon 1, M. Kim 1, S.-H. Yoo 2, J.-M. Kim 2 and Y.-S. Kim 2, 1 Gyeonggi Sci. High School and 2 Myongji Univ., Korea

Nano Tool 1P-7-59 Thermally-isolated Resonant Thermal Sensor Probe

N. Inomata and T. Ono, Tohoku Univ., Japan

1P-7-60 Piezoelectric Optical-absorption Spectroscopy of a GaAs/AlGaAs Heterostructure using Cantilever Mechanical Resonance

1P-7-61 High Sensitive Si Cantilevers for Magnetic Resonance Force Microscopy

1P-7-62 Contactleess Sheet Resistivity Measurement using Magnetic Force Microscopy

1P-7-64 Interaction Force Measurement between Antigens and Antibodies using Carbon Nanotube Cantilevers

1P-7-65 Fabrication of Superparamagnetic Nano-particles having Various Diameters by Strict Controlling of Magnetic Material Thickness

1P-7-66 Welding of Thin Pt Wires having Different Diameters by Joule Heating

1P-7-70 Impact of Residual Strain in an Organic Functional Martial during Thermal Nanoimprint Process

1P-7-71 Optical Evaluation of Photoinduced Liquid Crystalline Polymer Pattern fabricated by Thermal Nanoimprinting with Linearly Polarized UV Irradiation

T. Watanabe 1,2, H. Okamoto 1, K. Onomitsu 1 and H. Yamaguchi 1,2, 1 NTT and 2 Tohoku Univ., Japan

1P-7-63 Evaluation of Resonance Detection Properties on Vibration Measurement of the Mechanical Resonator using Scanning Probe Microscope R. Kometani, S. Mifune, S. Warisawa and S. Ishihara, Univ. of Tokyo, Japan

Y. Terada 1, S. Akita 1,2 and T. Arie 1,2, 1 Osaka Pref. Univ. and 2 JST-CREST, Japan

M. Toda, Y.J. Seo, Y. Kawai, H. Miyashita and T. Ono, Tohoku Univ., Japan

F. Wakaya, M. Kajiwara, S. Abo and M. Takai, Osaka Univ., Japan

M. Fujimori, H. Tohmyoh, and M. Saka, Tohoku Univ., Japan

H. Kim 1, H. Terazono 1, H. Takei 1,2 and K. Yasuda 1,3, 1 Kanagawa Academy of Sci. and Technol., 2 Toyo Univ. and 3 Tokyo Medical and Dental Univ., Japan

1P-7-67 Fabrication of a Mechanically Exfoliated Graphene Edge Emmiter on a Tungsten Probe and its Field Emission Properties K. Murakami, K. Yoshida, R. Ueki and J. Fujita, Univ. of Tsukuba, Japan

Nanoimprint, Nanoprint and Rising Lithographyano 1P-7-68 Development of Cleaning Process for UV Cured Resin Removal on Quartz Substrate for Nanoimprint Lithography

M.-S. Kim 1, B.-K. Kang 1, J.-S. Lim 1, J.-H. Jeong 1, J.-K. Kim 2, B.-K. Lee 2 and J.-G. Park 1, 1 Hanyang Univ. and 2 Samsung Electronics, Korea

1P-7-72 A Study of the Roller Imprinting Technology applied to Patterned Sapphire Substrate

S.-C. Yeh 1, Y.-Y. Chou 1, Y.-C. Lee 1, P.-J. Tsai 2, J.-W. Pan 2, H.-M. Chou 3, C.-H. Hou 3, Y.-Y. Chang 4, M.-S. Chu 4, M.-L. Hu 4 and C.-H. Ho 4, 1 Chung Yuan Christian Univ., 2 Natl. Chiao Tung Univ., 3 Lextar Electronics and 4 Procrystal Technol., Taiwan

1P-7-76 The Gasbag-assisted Side-emitting UV-curing Imprinting Process for Large-area Replication of Microstructures

Y.-Y. Huang, C.-H. Yang, N.-W. Chang and S.-Y. Yang, Natl. Taiwan Univ., Taiwan

1P-7-69 Mechanical Properties of Biodegradable Polylactide Structures fabricated using Thermal Nanoimprint

P.-T. Teng, F.-Y. Chang, T.-H. Tsai, Taiwan Univ. of Sci. and Technol., Taiwan

T. Shiotsu, N. Nishikura, M. Yasuda, H. Kawata and Y. Hirai, Osaka Pref. Univ., Japan

1P-7-73 Ultraviolet-curable Resins comprising a Diacrylate Monomer Hardly Absorbing Condensable Pentafluoropropane (PFP) Gas to achieve High Throughput in Ultraviolet Nanoimprinting using PFP

1P-7-74 Selective Grating Fabrication on Ti-diffused Waveguides in LiNbO3 by Imprint Lithography

1P-7-77 Computational Study on Molecular Orientation of Polymers in Nanoimprint Lithography

1P-7-78 Thickness Dependency Polymerization Efficiency UV-nanoimprint Resins

M. Nakao, S. Nakajima, S. Shinada and T. Kawanishi, Natl. Inst. of Information and Communications Technol., Japan

M. Okada 1, E. Nishioka 1, M. Kondo 1, Y. Haruyama1, T. Sasaki 2, H. Ono 2, N. Kawatsuki 1 and S. Matsui 1, 1 Univ. of Hyogo and 2 Nagaoka Univ. of Technol., Japan

1P-7-75 Enhanced Light Extraction from Red Phosphor Films via Nano-imprint Lithography using Zirconia Nanoparticles

K.-K. Kim 1, E.-J. Her 1, K.-Y. Ko 2, T.H. Won 2 and J. Ahn 1, 1 Hanyang Univ. and 2 Korea Inst. of Patent Information, Korea

S. Kaneko 1, C.Y. Min 1 and M. Nakagawa 1,2, 1 Tohoku Univ. and 2 JST-CREST, Japan

R. Takai 1, M. Yasuda 1, K. Tada 2, H. Kawata 1 and Y. Hirai 1, 1 Osaka Pref. Univ. and 2 Toyama Natl. College of Technol., Japan

of on

Y. Sawada 1,5, H. Miyake 2, T. Ohsaki 3, M. Okada 1,5, S. Iyoshi 1,5, Y. Haruyama 1,5, H. Hiroshima 4,5 and S. Matsui 1,5, 1 Univ. of Hyogo, 2 Daicel, 3 Toyo Gosei, 4 AIST and 5 JST-CREST, Japan

-7-

1P-7-79 Low-temperature Firing of Ag-Cu Nanoparticles during Direct Nanoimprinting

H. Tambo, Y. Yokoyama and Y. Sakai, Toyama Industrial Technol. Center, Japan

BioMEMS, Lab on a Chip 1P-7-80 Isolating Circulating Tumor Cells from Peripheral Blood with Large Volume utilizing Dielectrophoresis in Reversing Stepping Electric Fields

1P-7-81 Bright Transmitted-fluorescence Images of Neurons cultured on a Plasmonic Chip with Fluorescence Microscope

1P-7-82 Micropatterning of Single Mammalian Cells on the Chitosan Substrate for Drug Screening

1P-7-83 Single-cell Isolation and Sizing of Microorganisms by Microenclosure Array with Multipillar Structure

1P-7-84 Ultra High-speed Microdroplet Polymerase Chain Reaction System for Three-step Reverse Transcription of Single Cells using On-chip Three-channel Switching High-speed Liquid Circulating Module

1P-7-85 Surface Roughness of Cells as Index of Label-free Cell Identification and Separation in On-chip Imaging Cell Sorting System

1P-7-86 Novel Single Cell Extraction Method combined with Biomimetic Cell Surface Modification and Microfluidic Device

1P-7-87 Interaction Kinetics of Proteins confined within a Nanocavity evaluated by Real-time Single-molecule Fluorescence Imaging

1P-7-88 Development of Production Method of Protein Microarray Chips via Puromycin Technology

1P-7-89 A Microstructure-embedded Microfluidic Chip for Continuous Sample Separating Applications

1P-7-90 Development of Wafer-level Fabrication Process for SiO2 based Nanowell Array Chip and its Characterization

1P-7-91 Application of the ZnO-coated Plasmonic Chip immobilized with Anti-ZnO Antibody to Biosensing

1P-7-94 Fabrication of a Polylactide Micro-needle Array using Transfer Mold Technique for Transdermal Drug Delivery

1P-7-95 Quantitative Evaluation of Quasi-electrocardiogram Measurement for Direct Prediction of Lethal Arrhythmic Beating Occurrence using Ring-shaped Cardiomyocyte Network with Ring Electrode Array

H.-H. Wu, G.-H. Chen, C.-T. Huang and C.-P. Jen, Natl. Chung Cheng Univ., Taiwan

H. Terazono 1, H. Kim 1, H. Takei 2, A. Hattori 3, T. Kaneko 3, K. Yasuda 1,3, 1 Kanagawa Academy of Sci. and Technol., 2 Toyo Univ. and 3 Tokyo Medical and Dental Univ., Japan

S.R. Kumal 1, M. Biyani 1,2 and T. Ichiki 1,2, 1 Univ. of Tokyo and 2 JST-CREST, Japan

1P-7-92 Rapid and Sensitive Detection with Zinc Coating Plasmonic Chip

BDNF Oxide

M. Satoh 1,2 , K. Tawa 1, K. Uegaki 1, T. Hara 1, M. Umetsu 3, H. Nakazawa 3, I. Kumagai 3, H. Aota 2 and M. Kojima 1, 1 AIST, 2 Kansai Univ. and 3 Tohoku Univ., Japan

C. Yasui 1,2, C. Hosokawa 1, T. Fujita 1,3, J. Nishi 4, H. Aota 2, K. Tawa 1,3, 1 AIST, 2 Kansai Univ. 3 Kwansei Gakuin Univ. and 4 Hokkaido Univ., Japan

A. Hattori 1,2, T. Kaneko 1, F. Nomura 1 and K. Yasuda 1,2, 1 Tokyo Medical and Dental Univ. and 2 Kanagawa Academy of Sci. and Technol., Japan

S.K. Hsiung 1, R.C. Lin 1, H.C. Lee 2, Y.F. Chen 3, C.T. Wu 3 and C.H. Lin 2, 1 Fooyin Univ., 2 Natl. Sun Yat-Sen Univ. and 3 Gene Target Technol., Taiwan

1P-7-93 Development of On-chip Dual Measurement System for Cardiac Contraction Fluctuation Assay using Simultaneous Recording of Extracellular Field Potential and Optical Image

H.H. Shuai, C.Y. Yang, J.A. Yeh and C.M. Cheng, Natl. Tsing Hua Univ., Taiwan

A. Hibino 1, Y. Okamoto 1, T. Yasui 1, N. Kaji 1, M. Tokeshi 1,2 and Y. Baba 1,3, 1 Nagoya Univ., 2 Hokkaido Univ. and 3 AIST, Japan

S.-H. Cho 1, J.-K. Lee 2, J.-H. Lee 1, H.Y. Lee 2 and J.-G. Park 1, 1 Hanyang Univ. and 2 Northeastern Univ., Korea

A. Baba, Kyushu Inst. of Technol., Japan

T. Kaneko, F. Nomura, T. Hamada, A. Hattori and K. Yasuda, Tokyo Medical and Dental Univ., Japan

A. Matsutani and A. Takada, Tokyo Inst. of Technol., Japan

S. Ryu 1, S. Higano 1, K. Ohkubo 1, Y. Asano 1, A. Inoue 1, T. Ueno 2, T. Funatsu 2, T. Tanii 1, 1 Waseda Univ. and 2 Univ. of Tokyo, Japan

K. Tawa 1, C. Sasakawa 1, M. Umetsu 2, H. Nakasawa 2 and I. Kumagai 2, 1 AIST and 2 Tohoku Univ., Japan

F. Nomura, T. Kaneko, H. Hattori and K. Yasuda, Tokyo Medical and Dental Univ., Japan

Microsystem Technology and MEMS (Advanced Micro Devices) 1P-7-96 Fabrication of Silicon Microdisk Resonators with Monolithically Integrated Comb-drive Microactuators

1P-7-97 Very Low Voltage Nickel MEMS Switch based on Dynamic Driving Method

1P-7-99 Theoretical Study on Sensitivity of Planar Vibration Sensor

Y. Sato, Y. Kanamori and K. Hane, Tohoku Univ., Japan

Y. Komai, R. Kitamura, H. Tanigawa and K. Suzuki, Ritsumeikan Univ., Japan

1P-7-98 Implementation of a DETF Resonator in a Wafer-level 0.18-μm CMOS MEMS Process

1P-7-100 Structural and Material Design for Piezoelectric Energy Harvester using Vibration

1P-7-101 High Efficiency Near-infrared Detection using Deep-trench Photo-diode

1P-7-102 An Infrared Detector Array with Incident-ray Concentrating Structure

1P-7-103 Electrolytic Tilt Sensor with Domed Cavity for Improvement in Response Time

1P-7-104 All-polymer Tilt Sensor with Conductive Polydimethylsiloxane Electrodes

1P-7-105 Electrostatically Driven Peristaltic Pump

NEOARK CORPORATION

Carl Zeiss Microscopy Co., Ltd.

E. Komine 1, K. Sueshige 1, T. Suga 1, M. Ichiki 2,3 and T. Ito 2, 1 Univ. of Tokyo, 2 AIST and 3 JST-PRESTO, Japan

J.K. Lee, J.C. Choi, D.G. Jung, Y.C. Choi and S.H. Kong, Kyungpook Natl. Univ., Korea

T. Matsuda and A. Baba, Kyushu Inst. of Technol., Japan

S.-H. Tseng, Y.-J. Hung, H.-H. Tsai and Y.-Z. Juang, Natl. Applied Res. Labs., Taiwan

J.C. Choi 1, Y.C. Choi 1, D.G. Jung 1, J.K. Lee 1, W.I. Jang 2 and S.H. Kong 1, 1 Kyungpook Natl. Univ. and 2 ETRI., Korea

L. Zhang, J. Lu, H. Takagi and R. Maeda, AIST, Japan

J.C. Choi, Y.C. Choi, D.G. Jung, J.K. Lee and S.H. Kong, Kyungpook Natl. Univ., Korea

B. Kim1, K.S. Lee 2 and M.A. Shannon 2, 1 Catholic Univ. of Daegu, Korea and 2 Univ. of Illinois, USA

Commercial Session (Technical Exhibitor) GenISys GmbH

NTT Advanced Technology Corporation

Nanoscribe GmbH

HOLON CO., LTD. Room A (Zuiten Nishi 4F)

18:00-20:00 Banquet MNC 2012 Prof. Namba Award Ceremony Performance by Samba Show

-8-

Friday, November 2 Room A (Zuiten Nishi 4F)

Room B (Zuiten Naka 4F)

Room C (Zuiten Higashi 4F)

2D-8: 9:00-10:20 Nanofabrication I Chairpersons: T. Hasunuma (Univ. of Tsukuba) K. Kita (Univ. of Tokyo)

C:

2B-8: 9:00-10:00 Advanced Micro Devices Chairpersons: M. Sohgawa (Osaka Univ.) T. Sakata (NTT)

2C-8: Nanomaterials III Chairpersons: T. Chikyo (NIMS) T. Ishida (AIST)

2A-8-1 9:00 Self-Assembled Lithography and Potential Applications to Electronic Devices (Invited)

2B-8-1 9:00 Variable Resonant-frequency Tuning for Fishbone-shaped MEMS Resonator based on Multi-physics Simulator

2C-8-1 Withdrawn

2B-8-2 9:20 Coupling Properties of Freestanding Silicon Nanowire Waveguide Couplers with a Gap-variable Mechanism

H. Yoshida, Hitachi, Japan

Y. Akihama, Y. Munemasa, Y. Kanamori and K. Hane, Tohoku Univ., Japan

2C-8-2 9:20 PEGylated Silsesquioxane Nanoimprintable Material

2A-8-3 10:00 Directed Self-assembly for Functional Carbon Nanostructures (Invited)

2B-8-3 9:40 High Throughput Size-oriented Passive Droplet Sorting Device using Surface Free Energy with Simple Parallel Guide Grooves

2C-8-3 9:40 Dynamic Pattern Formation of Liquid Crystals caused by Mixed Self-assembled Monolayer of Ru Complex and Insulating Molecules immobilized on ITO

2D-8-3 9:40 Fabrication of the Ordered Array of Optical Centers in Diamond by Low Energy Ion Implantation

2C-8-4 10:00 Conjugated Polymer-dependent Opto-electrical Characteristics of Near Infrared Hybrid Solar Cells

2D-8-4 10:00 Anodic Condition Dependence of Current–voltage Characteristic of Resistive Change Memory using Anodic Porous Alumina

2A-8: 9:00-10:30 Symp. Directed Self Assembly I Chairpersons: T. Yamaguchi (NTT) H. Kudo (Kansai Univ.)

K. Asakawa, A. Hieno, S. Hattori, H. Nakamura, T. Nakanishi, R. Kitagawa and A. Fujimoto, Toshiba, Japan

2A-8-2 9:30 Chemical Epitaxy of Highly Segregating Block Copolymers for Single-Digit Nano Patterning (Invited)

S.O. Kim, KAIST, Korea

2D-8-1 9:00 Biomolecular Adsorption Control for CNT-domain Fabrication

I. Hanasaki 1, Y. Isono 1,3, B. Zheng 2,3, Y. Uraoka 2,3 and I. Yamashita 2,3, 1 Kobe Univ., 2 Nara Inst. of Sci. and Technol. and 3 JST-CREST, Japan

S. Kuroda, N. Suzuki, H. Tanigawa and K. Suzuki, Ritsumeikan Univ., Japan

Y. Harada, S. Numakunai, D.H. Yoon, T. Sekiguchi and S. Shoji, Waseda Univ., Japan

2A-8 Author's Interview: 12:15-12:25

9:20-10:20

Room D (Tenku 5F)

2B-8 Author's Interview: 10:00-10:10

Photocurable for Antibiofouling

B.K. Lee, D.-P. Kim, J.-H. Ryu, J. Park, Y.-S. Jeong, K.-H. Baek and L.-M. Do, ETRI, Korea

T. Ishida 1, M. Oyama 1, K. Terada 1 and M. Haga 2, 1 AIST and 2 Chuo Univ., Japan

M. Nam, S. Kim, M. Kang, S.-W. Kim and K.-K. Lee, Ajou Univ., Korea

2C-8 Author's Interview: 11:55-12:05

2D-8-2 9:20 Phosphorus Incorporation in 4H-SiC by Irradiation of Excimer Laser in Phosphoric Solution

K. Nishi, A. Ikeda, H. Ikenoue and T. Asano, Kyushu Univ., Japan

A. Komatsubara 1, T. Teraji 2, M. Hori 1, K. Kumagai 1, S. Tamura 1, T. Ohshima 3, S. Onoda 3, T. Yamamoto 3, C. Müller 4, B. Naydenov 4, L. McGuinness 4, F. Jelezko 4, T. Tanii 1, T. Shinada 5 and J. Isoya 6, 1 Waseda Univ., 2 NIMS, 3 JAEA, Japan, 4 Ulm Univ., Germany, 5 AIST and 6 Univ. of Tsukuba, Japan

S. Furuya 1, S. Otsuka 2, T. Shimizu 2, S. Shingubara 2, T. Watanabe 1, Y. Takano 1 and K. Takase 1, 1 Nihon Univ. and 2 Kansai Univ., Japan

2D-8 Author's Interview: 11:45-11:55

Robby (4F in front of Zuiten) Coffee Break Room A (Zuiten Nishi 4F)

Room B (Zuiten Naka 4F)

Room C (Zuiten Higashi 4F)

2A-9: Symp. C: Directed Self Assembly II Chairpersons: T. Azuma (Toshiba) T. Hirayama (Tokyo Ohka)

2B-9: BioMEMS, Lab on a Chip II Chairpersons: T. Ichiki (Univ. of Tokyo) Y. Takamura (JAIST)

2C-9: Nanomaterials IV Chairpersons: T. Ishida (AIST) X.W. Zhao (Tokyo Univ. of Sci)

2D-9: Nanofabrication II Chairpersons: S. Shingubara (Kansai Univ.) T. Asahi (Ehime Univ.)

2A-9-1 10:45 Extending the patterning capability using directed self-assembly (Invited)

2B-9-1 10:25 A Lab-on-Chip System for Rapid SNP Diagnostics from Human Blood (Invited)

2C-9-1 10:35 Strong Adhesion of Metal-encrusted Polymer onto Plastic Substrates

2D-9-1 10:35 Nanopore Based Ionic Field Effect transistor for DNA Manipulation (Invited)

J. Cheng 1, J. Pitera 1, G. Doerk 1, C.-C. Liu 1, M. Tjio 1, C. Rettner 1, H. Troung 1, H. Tsai 2, K. Lai 3, M. Guillorn 2 and D. Sanders 1, 1 IBM Almaden Res. Ctr., 2 IBM Watson Res. Ctr. and 3 IBM Semicon. Res. and Develop. Ctr., USA

I. Yamashita 1 and P. Fiorini 2 Panasonic, Japan and 2 IMEC, Belgium

J. Kawakita, Y. Hashimoto and T. Chikyo, NIMS, Japan

-9-

Room D (Tenku 5F)

M.-H. Lee, K.-B. Park, D.-J. Lee, H.-M. Kim and K.-B. Kim, Seoul Natl. Univ., Korea

2A-9-2 11:15 Lithography Processes using Directed Self-assembly (Invited)

M. Muramatsu 1 and K. Tanouchi 1, T. Tomita 1, T. Kitano 1 and S. Nagahara 2, 1 Tokyo Electron Kyushu and 2 Tokyo Electron, Japan

2A-9-3 11:45 Block Copolymer Orientation Control using a Top-Coat Surface Treatment (Invited)

T. Seshimo, C.M. Baates, M.J. Maher, W.J. Durand, J.D. Cushen, L.M. Dean, G. Blachut, C.J. Ellison, C.G. Willson, Univ. of Texas at Austin, USA

2A-9 Author's Interview: 12:15-12:25

2B-9-2 10:55 Multiplexed and Label-free Detection Platform Combining LSPR and Microfluidics

2C-9-2 10:55 Adaptability of DLC Film as Electronic Transmission Window

2D-9-2 11:05 Printed Nanostructures

2B-9-3 11:15 A Smart Gel-coupled Biotransistor as a New Basic for Biosensing

2C-9-3 11:15 Photoluminescence and Electronic Properties of Nanocrystalline Si doped SiO2 Thin Films formed by Co-sputtering

2D-9-3 11:25 Large-area Bi-layer Wire-grid Polarizers for Deep-ultraviolet to Infrared using EUV Interference Lithography and Nano Imprint Lithography

Y. Zhang 1,2, Y. Tang 1, Y.-H. Hsieh 3, C.-Y. Hsu 3, J. Xi 2, K.-J. Lin 3 and X. Jiang 1, 1 Natl. Center for Nanosci. and Technol., 2 Peking Univ., China and 3 Natl. Chung Hsing Univ., Taiwan

A. Matsumoto, Y. Maeda and Y. Miyahara, Tokyo Medical and Dental Univ., Japan

2B-9-4 11:35 Fabrication of Nanostructured Silicon Surface for Integrated Microfluidic Separation and Mass Spectrometry

T. Kozuki 1, N. Nawachi 2 and K. Itoh 2, 1 Hiroshima Internatl. Univ. and 2 Hiroshima Pref.Technol. Res. Inst., Japan

K. Hirata, T. Kogawa, Y. Komori and H. Katsumata, Meiji Univ., Japan

Acousto-optical

T. Kehoe1, J. Gomis-Bresco 1, J. Cuffe 1, F. Alzina 1, V. Reboud 1,2 D. Mendels 3 and C.M. Sotomayor Torres 1,4,5, 1 Catalan Inst. of Nanotechnol. Spain, 2 CEA-Leti, 3 Cognoscens, France, 4 ICREA and 5 UAB, Spain

L. Wang 1, H.H. Solak 3 and Y. Ekinci 1,2, 1 Paul Scherrer Inst., 2 ETH Zurich and 3 Eulitha, Switzerland

2C-9-4 Withdrawn

K.-H. Chen and C.-W. Tsao, Natl. Central Univ., Taiwan

2B-9 Author's Interview: 14:10-14:20

2C-9 Author's Interview: 11:35-11:45

2D-9 Author's Interview: 11:45-11:55

Room A (Zuiten Nishi 4F)

Room B (Zuiten Naka 4F)

Room C (Zuiten Higashi 4F)

Room D (Tenku 5F)

2A-10: Resists and DSA Materials and Processing Chairpersons: H. Yamamoto (Osaka Univ.) K. Nozaki (Fujitsu)

2B-10: BioMEMS, Lab on a Chip III Chairpersons: A. Matsumoto (Tokyo Medical and Dental Univ.) Y. Murakami (Toyohashi Univ. of Technol.) 2B-10-1 13:10 Paper-based ELISA for Detecting Various Diseases (Invited)

2A-10-1 13:40 EUV Resist Materials and Process Development for 16nm Half Pitch (Invited) M. Shimizu and T. Kimura, JSR, Japan

2A-10-2 14:10 Stochastic Effects and Resist Variability in High Resolution Lithography

A.V. Pret 1,2, R. Gronheid 1, K. Garidis 1,3 and J. Biafore 4, 1 IMEC, Belgium, 2 Kungliga Tekniska Högskolan, Sweden, 3 Katholieke Univ. Leuven, Belgium and 4 KLA-Tencor, USA

C.-M. Cheng, Natl. Tsing Hua Univ., Taiwan

2D-10: Nanofabrication III Chairpersons: K.-B. Kim (Seoul Natl. Univ.) T. Hasegawa (NIMS)

2C-10-1 13:20 In situ Transmission Electron Microscopy of Single Molecular Junctions using Carbon Nanocapsules Encapsulating Cobalt and Cobalt Carbide

2D-10-1 13:20 Integration of III-V Nanowires on Si and Device Applications (Invited)

2C-10-2 13:40 Non Jump-to-contact Approach between Tungsten Nanotips

2D-10-2 13:50 Control of Crystal Orientation and Diameter of Si Nanowire using Anodic Aluminum Oxide Template

D. Matsuura and T. Kizuka, Univ. of Tsukuba, Japan

2B-10-2 13:40 Fabrication of Pneumatic Valve with Dome-shape Fluid Chamber

C.K. Oh, D.K. Lee and O.C. Jeong, Inje Univ., Korea

H. Masuda and T. Kizuka, Univ. of Tsukuba, Japan

K. Tomioka 1,2, M. Yoshimura 1 and T. Fukui 1, 1 Hokkaido Univ. and 2 JST-PRESTO, Japan

T. Shimizu and S. Shingubara, Kansai Univ., Japan

2A-10-3 14:30 An in situ Analysis of the Dissolution Characteristics of Half Pitch Line and Space EUV Resist Patterns

2B-10-3 14:00 Study on the Vortex Behaviour in Micro Scale Chamber for the Trapping of Particles

2A-10-4 14:50 Sub-30 nm Contact Hole Process Study using Directed Self-assembly Lithography

2B-10 Author's Interview: 14:20-14:30

J.J. Santillan and T. Itani, EIDEC, Japan

2C-10: Nanomaterials V Chairpersons: T. Chikyo (NIMS) T. Tanii (Waseda Univ.)

B. Sharma 1,2, Y. Ukita 1 and Y. Takamura 1, 1 JAIST and 2 Univ. of Delhi, India

2C-10-3 14:00 In situ Observation of Formation Process of Negative Electron Affinity Surface of GaAs by Surface Photo-absorption

2D-10-3 14:10 Orientation-stabilized Lateral-growth of Ge-on-insulator Nano-wires by Rapid-melting-process

2C-10 Author's Interview: 14:20-14:30

2D-10 Author's Interview: 14:30-14:40

K. Hayase 1, T. Nishitani 2,3, K. Suzuki 1, H. Imai 1, J. Hasegawa 1, D. Namba 1 and T. Meguro 1, 1 Tokyo Univ. of Sci., 2 Nagoya Univ. and 3 RIKEN, Japan

H. Yonemitsu, H. Sato, Y. Seino, H. Kato, M. Kanno, K. Kobayashi, A. Kawanishi, K. Kodera and T. Azuma, Toshiba, Japan

2A-10 Author's Interview: 15:10-15:20

- 10 -

M. Anisuzzaman 1, S. Muta 1, M. Takahashi 1, A.M. Hashim 1,2, M. Miyao 1 and T. Sadoh 1, 1 Kyushu Univ., Japan and 2 Univ. Teknologi Malaysia, Malaysia

Room P1 (Kaiou 4F) and Room P2 (Ginga 4F)

2P-11: 14:40-16:40 Poster Session II Nanocarbons 2P-11-1 Fabricated the Field Emission Lamp with Carbon Nanocoils-graphene Sheets Hybrids

K.J. Chung 1, Y.M. Liu 1, N.W. Pu 2, M.D. Ger 1, C.A. Wang 1, 1 Natl. Defense Univ. and 2 Yuan Ze Univ., Taiwan

2P-11-2 Improvements of the Specific Capacity and High-rate Capability in Li Ion Batteries by Adding Graphene P.C. Wang 1, C.H. Wu 1, G.N. Shi 1, N.W. Pu 2, Y.M. Liu 1 and M.D. Ger 1, 1 Natl. Defense Univ. and 2 Yuan Ze Univ., Taiwan

2P-11-3 Transfer of Graphene onto the Anode of Organic Light Emitting Diodes T.L. Liu 1, G.N. Shi 2, N.W. Pu 1, K.C. Liu 3, C.H. Wu 3, 1 Yuan Ze Univ., 2 Natl. Defense Univ. and 3 Chang Gung Univ., Taiwan

2P-11-4 Boron-doped Ultrananocrystalline Diamond / Nonhydrogenated Amorphous Carbon Composite Films by Coaxial Arc Plasma Deposition Y. Katamune, S. Ohmagari, T. Hanada and T. Yoshitake, Kyushu Univ., Japan

2P-11-5 Fabrication of Cu-based Carbon Nanotube Composite Coating by using an Ultrasonic-assisted Electroplating Method

2P-11-6 Giant Chemiresistive Response to Gas Molecules from Semiconducting single-walled Carbon Nanotube Network

2P-11-7 Low Temperature SWNT Growth from Pt Catalyst using Alcohol Gas Source Method in High Vacuum

2P-11-8 Interfacial Nanostructure of the Polymer Electrolyte Fuel Cell Catalyst Layer constructed with Different Ionomer Contents

2P-11-9 Carbon Nanofoam Encapsulating Pt Nanoparticles formed by Laser Ablation of Graphite in Liquid Nitrogen

2P-11-10 n-Type Ultrananocrystalline Diamond/Hydrogenated Amorphous Carbon Composite Films prepared by Coaxial Arc Plasma Deposition

2P-11-11 Heavily Incorporated Nitrogen into Ultrananocrystalline Diamond/Hydrogenated Amorphous Carbon prepared by Pulsed Laser Deposition

2P-11-12 New Elemental Semiconductors of Fused Small Fullerenes

2P-11-14 Electrochemical Performance of Highly Porous Carbon Nanofiber for Non-aqueous Lithium-air Battery

2P-11-15 In situ Non-destructive Impedance Spectroscopic Study of Zn-porphyrin/C60 Heterojunction Solar Cells

2P-11-16 Topological Line-defect Induced Band Offset in Hexagonal Boron Nitride

2P-11-114L Plasma-oxidized Al2O3 for Gate Dielectrics in Graphene Field Effect Transistors

2P-11-115L Position-controlled Direct Graphene Synthesis on SiO2 Surface by Laser Irradiation

2P-11-116L Highly Sensitive Biosensors Based on Fragment-modified Graphene FET

G.-H. Park, M.-H. Jung, S. Inomata, H. Fukidome, T. Suemitsu, T. Otsuji and M. Suemitsu, Tohoku Univ., Japan

K. Koshida, K. Gumi, Y. Ohno, K. Maehashi, K. Inoue and K. Matsumoto, Osaka Univ., Japan

S. Okamoto, T. Ikuta, S. Zaifuddin, Y. Ohno, K. Maehashi, K. Inoue and K. Matsumoto, Osaka Univ., Japan

2P-11-19 Electrical Properties of Organic Bistable Devices fabricated utilizing Multi-core-shell CdSe/CdS/ZnS Nanoparticles Inserted the WO3 Layer

2P-11-20 Differentiation of Two Reset Operations in Pt/Cu/TiO2/Pt Stacked RRAMs

2P-11-21 Bipolar Resistive Switching Characteristics of Solution-processed HfO2 for Next-generation Non-volatile Memory Applications

2P-11-23 Fabrication of Hybrid-hyperlens for Superresolution Imaging

2P-11-24 Withdrawn

T. Suzuki, M. Kato, T. Fujino and H. Saito, Yamagata Res. Inst. of Technol., Japan

H. Kohno, K. Tatsutani and S. Ichikawa, Osaka Univ., Japan

2P-11-13 First-principles Simulations of Graphene Dual-double Gate Transistors M. Ohfuchi, Fujitsu Labs., Japan

H. Tabata and M. Katayama, Osaka Univ., Japan

H. Gima, S. Al-Riyami and T. Yoshitake, Kyushu Univ., Japan

M.J. Song, I.T. Kim, Y.B. Kim and M.W. Shin, Yonsei Univ., Korea

2P-11-17 Ultrastable Aqueous Graphite Nanofluids prepared by Single-step Liquid-phase Pulsed Laser Ablation (LP-PLA)

S.-W. Yun 1, M.-Y. Choi 1, D.-S. Kim 1, D.-S. Hong 2, J.-H. Kim 2 and Y.-T. Kim 1, 1 Pusan Natl. Univ. and 2 N-BAROTECH, Korea

H. Kondo 1, N. Fukuoka 1, Y. Mizutani 1, R. Ghosh 1, S. Naritsuka 1, T. Maruyama 1, S. Iijima 1,2, 1 Meijo Univ. and 2 AIST, Japan

K. Baba 1, T. Onuma 1, K. Iwasawa 1, M. Eguchi 1, Y. Kobayashi 1, K. Komatsu 2, M. Kobori 2, M. Nishitani-Gamo 2, T. Ando 3, 1 Ibaraki Univ., 2 Toyo Univ. and 3 NIMS, Japan

M. Maruyama 1 and S. Okada 1,2, 1 Univ. of Tsukuba and 2 JST-CREST, Japan

S. Al-Riyami, H. Gima and T. Yoshitake, Kyushu Univ., Japan

S. Ryuzaki 1 and J. Onoe 2, 1 Osaka Univ. and 2 Tokyo Inst. of Technol., Japan

Y. Tomita 1,2 and S. Okada 1,2, 1 Univ. of Tsukuba and 2 JST-CREST, Japan

Nanodevices 2P-11-18 Body Doping Profile of Select Device to Minimize Program Disturbance in 3-D Stack NAND Flash Memory B.-I. Choe 1,2, B.-G. Park 1 and J.-H. Lee 1, 1 Seoul Natl. Univ. and 2 Samsung Electronics, Korea

2P-11-22 UV Polarization Sensor using Photo-induced Anisotropic Dipole Moment in Photochromic Dye Film with Patterned Orientation

D.H. Park, M.-K. Park, C.-S. Park, J.-S. Park, S.-H. Kim and H.-R. Kim, Kyungpook Natl. Univ., Korea

2P-11-26 Coupled InGaAs Quantum Dots-in-a-well Solar Cell

K.Y. Chuang, T.E. Tzeng and T.S. Lay, Natl. Sun Yat-Sen Univ., Taiwan

C.H. Yoo, S.H. Ko and T.W. Kim, Hanyang Univ., Korea

S. Jung, J.-H. Oh, K.-C. Ryoo, S. Kim and B.-G. Park, Seoul Natl. Univ., Korea

P.L. Chen 1, Y.H. Lin 1, W.H. Cho 1, B.H. Cheng 2, Y.Z. Ho 3, M.H. Shiao 1, H.N. Lin 4 and D.P. Tsai 3,5, 1 Natl. Applied Res. Labs., 2 Natl. Cheng Kung Univ., 3 Natl. Taiwan Univ., 4 Natl. Tsing Hua Univ. and 5 Academia Sinica, Taiwan

2P-11-27 A cTnT Biosensor by using Nano-Patterned Conductive Molecule CB2C H.-T. Hsueh, C.-C. Peng and C.-T. Lin, Natl. Taiwan Univ., Taiwan

D.-H. Lee and W.-J. Kwangwoon Univ., Korea

Cho,

2P-11-25 Radiative Recombination Enhancement by Different Indium Composition Multiple Quantum Barriers in GaN Based Leds

E. Park 1, G. Kim 1, W. Kim 1, J. Kim 1, D. Kang 2, J.-K. Son 2 and B.-G. Park 1, 1 Seoul Natl. Univ. and 2 Samsung Electronics, Korea

2P-11-28 Development of Carbon Nanostructure Based Highly Transparent and Flexible Field Emitter D. Ghosh, P. Ghosh, T. Noda, Y. Hayashi and M. Tanemura, Nagoya Inst. of Technol., Japan

- 11 -

Nanofabrication 2P-11-29 Withdrawn

2P-11-30 Enhancing Air Retention by Bio-mimicking Salvinia Molesta Micro-structures

2P-11-31 Flexible InP Nanowire Array obtained by Epitaxial Growth and Peeling Off Process

2P-11-32 Localized Electroless Ag Plating at a Tip Apex for Scanning Kelvin Probe Microscopy

2P-11-33 Effect of Collision of Plumes on Formation of Compound Nanocrystal by Double Laser Ablation

2P-11-34 Insertion of Particles into Sub-100 nm Porous Structures by Electrophoresis Method

2P-11-35 Crystallization of Surface Layer of Magnetic Films with Gas Cluster ion Beams

2P-11-36 Fabrication of Sub-wavelength Antireflective Structure and Enhance the Efficiency of InGaAs Solar Cells

2P-11-37 Photoemission Analysis Oxidation States formed Supersonic O2 Beams Ge(111)-c(2×8) Surface

2P-11-38 Enhancement of Oxidation of Ge(100)-2×1 Surface caused by Supersonic O2 Molecular Beams

C.-Y. Yang, C.-Y. Yang and C.-K. Sung, Natl. Tsing Hua Univ., Taiwan

Y. Hashiguchi 1, H. Fukuoka 2, N. Sakamoto 3, Y. Yokoyama 1, A. Sugimura 1 and I. Umezu 1, 1 Konan Univ., 2 Nara Natl. Coll. of Technol. and 3 Iwaki Meisei Univ., Japan

of by on

R. Okada 1,2, A. Yoshigoe 1, Y. Teraoka 1,3, A. Jinno 1,3, Y. Yamada 2 and M. Sasaki 2, 1 JAEA, 2 Univ. of Tsukuba and 3 Univ. of Hyogo, Japan

K. Kusdianto, K. Sasaki and I.W. Lenggoro, Tokyo Univ. of Agriculture and Technol., Japan

A. Yoshigoe 1, R. Okada 1,2, Y. Teraoka 1,3, A. Jinno 1,3, Y. Yamada 2 and M. Sasaki 2, 1 JAEA, 2 Univ. of Tsukuba and 3 Univ. of Hyogo, Japan

T. Endo 1, E. Nakai 1, M. Yoshimura 1, K. Tomioka 1,2 and T. Fukui 1, 1 Hokkaido Univ. and 2 JST-PRESTO, Japan

N. Toyoda, A. Yamaguchi, A. Fujimoto and I. Yamada, Univ. of Hyogo, Japan

2P-11-39 Nanocrystalline V-doped CaCu3Ti4O12 Powders prepared by a Simple PEG Sol-gel Method and its Giant Dielectric Properties N. Sangwong and P. Thongbai, Khon Kaen Univ., Thailand

C.-T. Lin 1, M.-H. Yu 2, J. Su 1, P.-L. Chen 1, M.-H. Shiao 1 and M.-N. Chang 2, 1 Natl. Applied Res. Labs. and 2 Natl. Chung Hsing Univ., Taiwan

C.-C. Chang, Y.-Y. Chou, and Y.-C. Lee, Chung Yuan Christian Univ., Taiwan

2P-11-40 Fabrication of the Metal Slit Pattern for Angle controlled Lateral Electric Field to InAs / GaAs QDs and their Optical Properties S. Odashima 1, H. Nakajima 1,2 and I. Suemune 1, 1 Hokkaido Univ. and 2 JSPS, Japan

2P-11-41 Formation of Silicon Supersaturated with Deep Impurities by Pulsed Laser Melting Method

2P-11-42 Fabrication of Nanostructured Cu2ZnSnS4 using Electrodeposition with AAO Template

2P-11-43 Rectifying Optical Antenna Array–sensing and Light Energy Harvesting

2P-11-45 Selective Adsorption of Ta2O5 Nanoparticles synthesized by Biomineralization

2P-11-46 Nanopore Based Ionic Effect Transistor

2P-11-47 Height and Edge Shape Correction on the Nanostructure Fabrication by Focused-ionbeam Chemical Vapor Deposition

2P-11-48 Surface Plasmon Effect on Emission Efficiency of InGaN/GaN Multi-quantum Wells by Stripe Patterned Silver Film

2P-11-117L Role of Au Nanoparticle Decoration on Cross-linked WO3 Nanodomes for Selective Gas Sensing

2P-11-118L Direct EB Patterning of Functional Oxide Mask on Non-plant Surfaces Applied for GaAs Nanostructures

2P-11-53 Preparation of Ti-Si-C Thin Films by Magnetron Sputtering using Elemental Targets at Low Temperatures

2P-11-54 Temperature-dependent Interlayer Coupling in Fe3Si/FeSi2 Artificial Lattices

D. Kawabe, Y. Matsuda, A. Sugimura and I. Umezu, Konan Univ., Japan

T. Ban 1,2, M. Uenuma 1,2, Y. Ishikawa 1,2, I. Yamashita 1,2 and Y. Uraoka 1, 2, 1 Nara Inst. of Sci. and Technol. and 2 JST-CREST, Japan

2P-11-49 Fabrication of the High Density Capacitors for the Embedded Substrate using the Hydrophobic and Hydrophilic Properties of SAM

Y. Tanaka 1, C. Wang 1, A. Kondou 1, T. Terui 2, S. Tanaka 2, T. Shimizu 1 and S. Shingubara 1, 1 Kansai Univ. and 2 Natl. Inst. of Information and Communications Technol., Japan

Field

M.-H. Lee, S.-W. Nam and K.-B. Kim, Seoul Natl. Univ., Korea

M.Y. Kang 1, M.-H. Lee 1, H.-M. Kim 1, G. Fernandes 2, J. Xu 1,2 and K.-B. Kim 1, 1 Seoul Natl. Univ., Korea and 2 Brown Univ., USA

Y. Murao, R. Kometani, S. Warisawa and S. Ishihara, Univ. of Tokyo, Japan

2P-11-50 Low-cost Patterning Process for the Fabrication of Sub-32 nm Devices

S. Pauliac-Vaujour, P. Brianceau and C. Comboroure, CEA-LETI, France

M. Ichiki 1,3, S. Makino 2 and B.J. Kim 2, 1 AIST, 2 Univ. of Tokyo and 3 JST-PRESTO, Japan

Y.-S. Shim 1,2, H.G. Moon 1, D.H. Kim 1, H.W. Jang 3, Y.S. Yoon 2, 1 KIST , 2 Yonsei Univ. and 3 Seoul Natl. Univ., Korea

2P-11-44 Temperature Dependence of Resistance of Conductive Filament formed by Dielectric Breakdown

S. Otsuka, T. Kato, T. Kyomi, Y. Hamada, Y. Tada, T. Shimizu and S. Shingubara, Kansai Univ., Japan

K.S. Lee, S.P. Kim, D.U. Lee and E.K. Kim, Hanyang Univ., Korea

Y. Matsuoka, K. Ashida and T. Kaneko, Kwansei Gakuin Univ., Japan

Nanomaterials 2P-11-51 Growth of Ultrananocrystalline Diamond/amorphous Carbon Composite Film by Laser Ablation of Graphite in Nitrogen Atmosphere

2P-11-52 Electron Transmission Properties of Diamond-like Carbon Film

2P-11-55 Preparation of Patterned ZnO Nanowires Arrays using Porous PMMA Templates for the Improvement of Light Output Power of GaN Based LEDs

2P-11-56 Growth of Electroplated Zn Seeds/ZnO Nanorods and Chemical Selective Etching of ZnO Nanotubes on Transparent Conductive Substrates by Aqueous Solution

2P-11-57 Growth of Aligned Single-crystalline TiO2 Nanorod Arrays on Transparent Conducting Oxide Coated Glass

2P-11-58 Preparation of the Morphology-controllable Hexagonal WO3 Nanorods by a Hydrothermal Method

2P-11-60 Rapid Synthesis Nanowires by Plasma-enhanced Vapor Deposition

2P-11-61 Carbon-coated Magnetite Clusters (nFe3O4) as an Anode Material for Improved Li-ion Batteries

2P-11-62 Effect of Nitrogen Precursor on Growth of GaAs(N) Nanowires

S. Al-Riyami, H. Gima and T. Yoshitake, Kyushu Univ., Japan

T.-H. Lin, Y.-W. Hsu, Y.-C. Tu, P.-R. Wang, F.-S. Tsai and S.-J. Wang, Natl. Cheng Kung Univ., Taiwan

2P-11-59 Fluorescence Enhancement Via Local Synthesis of ZnO Nanowires in Microfluidic Devices

C.-H. Sang 1, C.-C. Chen 2 and J.-T. Sheu 1, 1 Natl. Chiao Tung Univ. and 2 Natl. Applied Res. Labs., Taiwan

N. Nawachi 1, K. Itoh 1 and T. Kozuki 2, 1 Hiroshima Pref. Technol. Res. Inst. and 2 Hiroshima Internatl. Univ., Japan

C.M. Yang 1, M.H. Hona 2 and I.C. Leu 1, 1 Natl. Univ. of Tainan and 2 Natl. Cheng Kung Univ., Taiwan

of V2O5 Microwave Chemical

M.W. Huang 1, F.S. Shieu 1 and H.C. Shih 1,2, 1 Natl. Chung Hsing Univ. and 2 Chinese Culture Univ., Taiwan

T. Sonoda, S. Nakao Ikeyama, AIST, Japan

and

M.

J.-C. Tsai 1, M.-H. Hon 1 and I.-C. Leu 2, 1 Natl. Cheng Kung Univ. and 2 Natl. Univ. of Tainan, Taiwan

H.D. Oh, S.-E. Kim and S.-W. Lee, Gachon Univ., Korea

- 12 -

K. Sakai 1, Y. Noda 2, D. Tsumagari 2, T. Sonoda 2, S. Hirakawa 2, K. Takeda 3 and T. Yoshitake 2, 1 Kurume Natl. Coll. of Technol., 2 Kyushu Univ. and 3 Fukuoka Inst. of Technol., Japan

C.-H. Lu 1, M.H. Hon 1 and I.-C. Leu 2, 1 Natl. Cheng Kung Univ. and 2 Natl. Univ. of Tainan, Taiwan

K. Sakai, T. Haraguchi, T. Yamauchi, T. Suzuki and T. Ikari, Univ. of Miyazaki, Japan

2P-11-63 Structure and Conductance of Atomic-sized Tungsten Contacts

H. Masuda and T. Kizuka, Univ. of Tsukuba, Japan

2P-11-64 In situ High-resolution Transmission Electron Microscopy of Deformation of Aluminum Nanocontacts T. Ohko and T. Kizuka, Univ. of Tsukuba, Japan

2P-11-65 First-principle Calculation of Conductance of Single-atom-width Gold Wires using Structural Models obtained from Transmission Electron Microscopy

2P-11-66 Measurement of Critical Shear Stress in Nanometer-sized Gold by in situ High-resolution Transmission Electron Microscopy

2P-11-69 Dielectric Properties CaCu3Ti4O12/BaTiO3 Nanocomposites

2P-11-70 Synthesis and Structure Analysis Of La0.5Sr0.5TiO3 Nanoparticle prepared by Thermal Decomposition Method

R. Kimikoube and T. Kizuka, Univ. of Tsukuba, Japan

2P-11-67 Chacracterization of MIS capacitor with PMMA:TiO2 as Insulator

L.N. Ismail, N.N. Hafizah, N.S.M. Sauki, A. Zain, S.H. Herman and M. Rusop, Univ. Teknologi MARA, Malaysia

2P-11-71 Characterization of TiO2/Carbon Composite Nanostructure for Lithium Ion Battery

K. Iwasawa 1, K. Miyoshi 1, S. Ueda 1, M. Eguchi 1, Y. Kobayashi 1, M. Kobori 2, M. Nishitani-Gamo 2 and T. Ando 3, 1 Ibaraki Univ., 2 Toyo Univ. and 3 NIMS, Japan

2P-11-119L Hydrothermal Synthesis and Electrochemical Characterization of TiO2(B) Nanosheets for Battery Application

H.Y. Wu 1, M.H. Hon 1, C.Y. Kuan 1 and I.C. Leu 2, 1 National Cheng Kung Univ. and 2 Natl. Univ. of Tainan, Taiwan

2P-11-68 Interface Dependent Mangeoelectricity of FePt-BaTiO3 Heterojunction M. Lee and Y.-C. Chung, Hanyang Univ., Korea

2P-11-72 Visible Electroluminescence of a Sm-doped n-TiO2/p-NiO/p+-Si Light Emitting Diode T. Ohtsuki 1, S. Harako 1, S. Komuro 2 and X. Zhao 1, 1 Tokyo Univ. of Sci. and 2 Toyo Univ., Japan

of

J. Jumpatam and P. Thongbai, Khon Kaen Univ., Thailand

2P-11-73 Characteristics of Nickel Oxide Thin Films formed by RF Magnetron Sputtering

T. Obata 1, S. Harako 1, S. Tanaka 1, S. Komuro 2, G. Wang 3 and X. Zhao 1, 1 Tokyo Univ. of Sci., 2 Toyo Univ., Japan and 3 Tianjin Univ. of Technol. and Education, China

T. Iijima and T. Kizuka, Univ. of Tsukuba, Japan

L. Wannasen and E. Swatsitang, Khon Kaen Univ., Thailand

2P-11-74 Light Output Improvement of GaN-based Light-emitting Diodes using Hydrothermally Grown ZnO Nanotapers

Y.-C. Tu, S.-J. Wang, J.-C. Lin, F.-S. Tsai, T.-H. Lin and P.-R. Wang, Natl. Cheng Kung Univ., Taiwan

2P-11-120L Photophysical Properties of Europium doped Ceramics Nanoparticles in Bio/medical Polymer Matrix

S. Abe 1, Y. Hamba 1, S. Yamagata 1, M. Uo 2, J. Iida 1, T. Kiba 1, A. Murayama 1 and F. Watari 1, 1 Hokkaido Univ. and 2 Tokyo Medical and Dental Univ., Japan

Nanoimprint, Nanoprint and Rising Lithography 2P-11-75 Fine Metal Mask Fabrication for Plasma Etching by Electroless Ni Plating

2P-11-76 Control of Resin Filling and Pattern Quality of Ultraviolet Nanoimprint Lithography by Pentafluoropropane and Helium Ambience

2P-11-77 Novel Hetero Structured Organic Photovoltaics (OPV) by Multi-layered Direct Nanoimprint

2P-11-79 Evaluation of Interaction Force between UV Resin and F-SAMs by Dynamic Contact Angle Measurement in PFP Gas Ambient

2P-11-80 Direct Metal Imprinted Nanostructures with Antireflective and Enhanced Transmittance

2P-11-81 Large Area Flatness Measurement and Optimization for Step and Repeat UV Nanoimprinting

2P-11-82 Fabrication of Highly Ordered Nanoimpint Stamp using Nanosphere Lithography with Guide Line Pattern

2P-11-83 Evaluation of De-molding Energy for Various Molds and De-molding Modes

2P-11-84 Impacts of Side Wall Profile on Demolding Force for Imprint Process

2P-11-85 Resolution Limits of Fluorescent Nanoimprinted Patterns on Fluorescence Microscopic Observation

2P-11-86 Improvement of Un-filling Defect in Low-pressure Thermal Nanoinprint using hydrofluoroether

2P-11-88 Improvement of Sensing Properties using Parasitic BJT Read Method on the OHA Gate Dielectric EGFET

2P-11-89 Investigation of Gas-liquid Phase Microdroplet Formation Mechanism in Microchannel

2P-11-90 Continuous Density Gradient Centrifugation using a Centrifugal Microfluidic Device

2P-11-92 Clepsydra-based Autonomous Flow Sequencer with Liquid Trap Reservoir

2P-11-93 Batteryless Love Wave-based Neural Probe and its Wireless Characterization

2P-11-94 Preparation of a Glucose/Oxygen Biofuel Cell based on Carbon Nanotube

T. Kitagawa 1, H. Kawata 1,2, M. Yasuda 1,2 and Y. Hirai 1,2, 1 Osaka Pref. Univ. and 2 JST-CREST, Japan

M. Chinen 1,3, Y. Kang 1,3,4, M. Okada 1,3, Y. Haruyama 1,3, H. Hiroshima 2,3 and S. Matsui 1,3, 1 Univ. of Hyogo, 2 AIST, 3 JST-CREST and 4 JSPS, Japan

T. Nishino 1,2, N. Fujikawa 1,2, H. Kawata 1,2 and Y. Hirai 1,2, 1 Osaka Pref. Univ. and 2 JST-CREST, Japan

S.-W. Youn 1,2, K. Suzuki 1,2, Q. Wang 1,2 and H. Hiroshima 1,2, 1 AIST and 2 JST-CREST, Japan

S.-G. Sung, J.-H. Lee, J.-H. Jeong, E.-S. Lee and J.-H. Choi, Korea Inst. of Machinery & Materials, Korea

H. Kawata 1,2, H. Noma 1,2, N. Fujikawa 1,2, H. Okuno 1, M. Yasuda 1,2 and Y. Hirai 1,2, 1 Osaka Pref. Univ. and 2 JST-CREST, Japan

K. Tomohiro 1, K. Tada 2, M. Ishikawa 2, H. Fujita 1, N. Nishikura 1, H. Kawata 1 and Y. Hirai 1, 1 Osaka Pref. Univ. and 2 Toyama Natl. College of Technol., Japan

K. Ishibashi 1,2, H. Goto 2, J. Mizuno 1 and S. Shoji 1, 1 Waseda Univ. and 2 Toshiba-Machince, Japan

S. Kubo 1, T. Tomioka 1 and M. Nakagawa 1,2, 1 Tohoku Univ. and 2 JST-CREST, Japan

2P-11-78 Gold Nanoparticles Self-assembly assisted with Imprinted HSQ Pattern for SERS Measurement Y. Kang 1,2, R. Takahashi 1, T. Fukuoka 1, Y. Utsumi 1, M. Okada 1, Y. Haruyama 1 and S. Matsui 1, 1 Univ. of Hyogo and 2 JSPS, Japan

S.K. Lim 1, S.H. Nasasw 1, E.M. Park 1, J.S. Kim 1, S.H. Ra 2 and S.J. Suh 1, 1 Sungkyunkwan Univ. and 2 Samsung Electro-Mechanics, Korea

H. Mekaru and H. Hiroshima, AIST, Japan

BioMEMS, Lab on a Chip 2P-11-87 Effect of Surface Morphology on Performance of Micro-coil for Concentrated Magnetic Beads

C.-C. Chen, S.-H. Hsu, C.-C. Yang, C.-M. Wu and C.-M. Huang, Natl. Applied Res. Labs., Taiwan

2P-11-91 Fabrication of PTFE Micro Fluidic Chip for Processing of Amino Acid Derivatization H. Kido 1, I. Okada 2, Y. Utsumi 1, T. Asami 1 and H. Mita 3, 1 Univ. of Hyogo, 2 Nagoya Univ. and 3 Fukuoka Inst. of Technol., Japan

J.-K. Park, T.-E. Bae and W.-J. Cho, Kwangwoon Univ., Korea

M. Ishizawa 1, H. Nose 1, Y. Ukita 2 and Y. Utsumi 1, 1 Univ. of Hyogo and 2 JAIST, Japan

C.W Chung, K.S Jhen and C.W Tsao, Natl. Central Univ., Taiwan

I.K. Jung, H. Oh and K. Lee, Ajou Univ., Korea

- 13 -

T. Oguro, Y. Ukita and Y. Takamura, JAIST, Japan

L.T.M. Nguyen, M.H. Koo and H.H. Yoon, Gachon Univ., Korea

2P-11-95 Photocatalytic Decomposition of Organosilane Monolayer on TiO2 and its Application to In-situ Modification of a Cell-culture Surface

2P-11-96 Proposal of Particle Size Sorting Method by Surface Acoustic Wave Actuator

2P-11-99 Human Placenta-derived Multipotent Stem Cells (PDMCs) Culture and Derivation on a Microfluidic Chip

T. Demura 1, H. Yamamoto 2, M. Morita 1, S. Kono 1, S. Nakamura 2, T. Tanii 1, 1 Waseda Univ. and 2 Tokyo Univ. of Agriculture and Technol., Japan

M.-Z. Chiang and C.-W. Tsao, Natl. Central Univ., Taiwan

2P-11-97 Passive LOVE Wave Biosensor for Simultaneous Detection of Multiple Elements in a Single Sensor

2P-11-98 Electrokinetic Protein Preconcentration using Nanochannels Created by Nanoparticle Deposition

2P-11-100 High Performance of Fully Depleted SOI Based Dual Gate Ion-sensitive Field-effect Transistor using the Solution-processed Al2O3 Sensing Membranes

2P-11-101 Dual Detection of DNAs by using Quantum Dots Based Microfluidic Chip

2P-11-102 Optofluidic Device with SERS Active Three Dimensional Gold Nanostructure

2P-11-122L Withdrawn

2P-11-123L Fabrication of Hydrophilic Polydimethylsiloxane (PDMS) with Wrinkled Surface D.K. Lee, C.K. Oh, and O.C. Jeong, Inje Univ, Korea

Y. Arisue 1, T. Saiki 2, K. Kuramoto 1, Y. Hata 1, H. Shizuka 1, K. Maenaka 1 and Y. Utsumi 1, 1.Univ. of Hyogo and 2 Hyogo Pref. Inst. of Technol., Japan

H. Oh, K.J. Lee, J.-H. Kim, S.S. Yang and K. Lee, Ajou Univ., Korea

H.N. Noh and J.S. Kim, Gachon Univ., Korea

C.-L. Ma, C.-C. Kuo and C.-P. Jen, Natl. Chung Cheng Univ., Taiwan

R. Takahashi, T. Fukuoka and Y. Utsumi, Univ. of Hyogo, Japan

T.-E. Bae, H.-J. Jang and W.-J. Cho, Kwangwoon Univ., Korea

2P-11-121L Sensor Application Based on CVD-synthesized Graphene S. Zaifuddin 1, S. Okamoto 1, Y. Ohno 1, T. Ikuta 1, K. Maehashi 1, M. Miyake 1,2 and K. Matsumoto 1, 1 Osaka Univ. and 2 AIXTRON, Japan

Microsystem Technology and MEMS 2P-11-103 A Simple and Effective One Step Transfer Method of Hydrophobic Surface on Polyester Fabric H. Hafeez, S.-H. Cho, D.-H. Han, Y.-G. Seo and J.-G. Park, Hanyang Univ., Korea

2P-11-107 Laminated Capacitor formed in Thermoplastic Resin Substrate by Laser-assisted Micro Powder Jet Implantation

K. Suzuki 1, S. Kameya 1, T. Sugai 1, H. Ohuchi 1, K. Miura 2 and T. Kuriyagawa 3, 1 Sendai Natl. College of Technol., 2 Miura Sensor Res. and 3 Tohoku Univ., Japan

2P-11-104 Peeling Property and Application of Ferroelectric Thin Film Structure

F. Honda 1, T. Hosono 1, M. Fujino 1, T. Suga 1, M. Ichiki 2,3 and T. Itoh 2, 1 Univ. of Tokyo, 2 AIST and 3 JST-PRESTO, Japan

2P-11-108 Square Microlens Arrays fabricated by Pinning UV Curable Polymers on the Partition Walls formed on Polymeric Substrates

S. Yasuda and K. Shimizu, Fuji Xerox, Japan

2P-11-111 A Study of the Effect of Current Density Distribution in Electrochemical Etching Process for Metal Mold Fabrication by Experiment and Numerical Method

2P-11-112 3D Anisotropic Wet Etching Simulate for Z-plate Quartz Wafer Rectangle Groove Etching

2P-11-125L Dry Etching of Quartz Glass using C4F8/He Plasmas for Microtrenches with Photoresist and Metal Mask

2P-11-126L Design and Fabrication of Tip attached MEMS Test Socket

M. Zhao, H. Ohigawa, J. Ji and T. Ueda, Waseda Univ., Japan

2P-11-105 Study on Homogeneous Wafer Level Dielectric Film Preparation using Chemical Solution Deposition Method

2P-11-106 Nano-size Structure for Optical Device Application

2P-11-109 A High-efficiency Beam Splitter of a Double-groove Blazed Grating using Ultra-precision Manufacturing

2P-11-110 Directional Difference of Patterning Characteristics in Scan-projection Lithography using a Gradient Index Lens Array

K. Sueshige 1, T. Suga 1, M. Ichiki 2,3 and T. Itoh 2, 1 Univ. of Tokyo, 2 AIST and 3 JST-PRESTO, Japan

J.-H. Hsu 1, C.-H. Lee 2 and R. Chen 1, 1 Natl. Tsing Hua Univ. and 2 Feng Chia Univ., Taiwan

2P-11-113 Influences of UV-Exposure Dose on Adhesive Strength between a Micro-sized SU-8 Component and a Si Substrate

C. Ishiyama, Tokyo Inst. of Technol., Japan

H.-Y. Ryu 1, H.-S. Im 2, S.-H. Cho 1, B.-J. Hwang 2, S.-H. Lee 2 and J.-G. Park 1, 1 Hanyang Univ. and 2 KITECH, Korea

Y.-H. Tang, M.-J. Huang and M.-H. Shiao, Natl. Applied Res. Labs., Taiwan

J.M. Lee 1, S.W. Kim 1, J.W. Nam 2, B.H. Kim 3, C.S. Cho 4 and H.S. Choi 1, 1 DGIST, Korea, 2 CoreMEMS, USA, 3 Catholic Univ. of Daegu and 4 Kyungpook Natl. Univ., Korea

2P-11-127L Fabrication of High Resolution Tactile Sensor Using Through-Si-via Technology H. Yokoyama 1, M. Sohgawa 1, T. Kanashima 1, M. Okuyama 1 and H. Noma 2, 1 Osaka Univ. and 2 Advanced Telecommunications Res. Inst. Internatl., Japan

- 14 -

D.Y. Kong 1, J.H. Oh 1, B.H. Kim 2, C.S. Cho 1 and J.H. Lee 1, 1 Kyungpook Natl. Univ. and 2 Catholic Univ. of Daegu, Korea

T. Horiuchi, T. Suzuki and H. Kobayashi, Tokyo Denki Univ., Japan

2P-11-124L Supporting Optimization High-Frequency Resonator

Structure for a Quartz

J. Ji, H. Ohigawa, M. Zhao and H. Yu, T. Ueda, Waseda Univ., Japan

2P-11-128L High-responsivity Wavelengthselective Gate/body-tied MOSFET-type Photodetector with Metal-grating S.-H. Jo 1, H.H. Lee 1, M. Bae 1, J. Choi 1, J. Ahn 1, S. Kim 1, H.-K. Lyu 2 and J.-K. Shin 1, 1 Kyungpook Natl. Univ. and 2 Daegu-Gyeongbuk Inst. of Sci. and Technol., Korea Kyungpook Natl. Univ. and 2 Daegu-Gyeongbuk Inst. of Sci. and Technol., Korea